Our company's unique multilayer film deposition multi-mirror lamp house-equipped device.
■ Adoption of a multi-mirror lamp house results in a highly uniform illumination distribution. ■ Improved operability with the adoption of various automatic mechanisms, allowing for semi-automatic use. ■ The alignment microscope features a trinocular tube. Alignment via a monitor is also possible (optional).
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basic information
<Standard Specifications> 【Maximum Supported Board Size】φ4 inches 【Maximum Supported Board Thickness】2mm 【Maximum Supported Mask Size】5×5 inches 【UV Lamp Housing】Multi-mirror type 【Irradiance Intensity】＞14mW/cm² (at 405nm) 【Illuminance Uniformity】＜±4.0% 【Exposure Light Source】UV Lamp 500W 【Exposure Wavelength】Broadband (g, h, i lines) 【Exposure Timer】Switching type Timer set 0–999.9 seconds / Cumulative light amount counter type 1–9999 counts 【UV Lamp Degradation Compensation Function】Standard equipment 【Alignment Scope】Binocular microscope with objective lens spacing of 18–60mm 【Microscope Resolution】1.2μm (when using 20× objective lens) 【Alignment Gap Measurement Function】Standard equipment 【Contact Method】Soft contact / Hard contact 【Manipulator Movement Range】X・Y ±5mm fine movement 1/8mm per rotation, θ:70° fine movement ±7°, Z:4mm (pneumatic drive 1mm / coarse movement 3mm) fine movement 0.16mm 【Cross Movement Stage Movement Range】X・Y ±20mm 【Vibration Isolation Table】Standard equipment
Price information
It may vary depending on the specifications. Please contact us first.
Price range
P7
Delivery Time
※It will take 2 to 3 months after placing the order for the standard specifications.
Applications/Examples of results
This is a research and development alignment microscope exposure system used in the front-end of semiconductor manufacturing and in the development and prototyping stages of new devices, such as semiconductor devices and various sensors. It is also adopted for small to medium-scale manufacturing and for producing specific devices. We have a track record of deliveries mainly to private companies that own research facilities in government agencies, universities (science and engineering departments), and materials manufacturers.
Detailed information
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【Model】MA-20 【Line Width】1μm (L&S) 【Resist】OFPR-800LB (Tokyo Ohka Kogyo) 【Film Thickness】1μm
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【Model】MA-20 【Line Width】8μm (Square Hole) 【Resist】e-PR THICK (e-chem Japan) 【Film Thickness】6.3μm
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【Model】MA-60F 【Line Width】2μm (L&S) 【Resist】OFPR-800LB (Tokyo Ohka Kogyo Co., Ltd.) 【Film Thickness】1μm
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【Model】MA-60F 【Line Width】6μm (Square Hole) 【Resist】e-PR THICK (e-chem Japan) 【Film Thickness】6.2μm
Line up（5）
| Model number | overview |
|---|---|
| Mask Liner MA-20 | |
| Mask Liner MA-10B | |
| Mask Liner MA-60F | |
| Mask Liner M-1S | |
| Mask Liner M-2LF |
catalog（5）
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Company information
We provide a complete range of equipment necessary for the front-end processes of semiconductor manufacturing, such as resist coating, exposure, development, and etching, all in a one-stop service. Additionally, we have alternative models for all types of spin coaters and respond quickly in case of malfunctions, ensuring comprehensive after-sales support. Furthermore, we visit research sites to offer advice on various issues that arise during research. We work together with our customers to identify which processes have problems and how to improve them, guiding them to solutions. We are not just a company that sells equipment; we act as consultants for semiconductor-related inquiries, supporting the entire semiconductor manufacturing process.
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