Improvement of gas usage efficiency with a low-capacity chamber! Achievements in providing support for mass production.
Our company received an OEM production request from a semiconductor manufacturing equipment manufacturer and implemented the internal wiring. We conducted both internal and external wiring for both the development and mass production machines. Additionally, we created materials for the wiring diagrams and independently developed inspection sheets and inspection jigs to support mass production. Please feel free to contact us when you need our services. 【Overview of Production Achievements】 ■ Mass production-capable 300mm wafer plasma CVD equipment ■ Improved gas usage efficiency through low-capacity chambers ■ High reproducibility between chambers and wafers ■ Low COO ■ Enhanced maintainability ■ High power efficiency *For more details, please download the PDF or feel free to contact us.
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【Client Information】 ■Major Semiconductor Manufacturer *For more details, please download the PDF or feel free to contact us.
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Shinano Seiki has been developing its business under the management philosophy of "pursuing customer satisfaction and technological capability to the utmost and contributing to society." Each member of the group, based on this management philosophy, is uniting their efforts with high technology, a desire for improvement, and a professional mindset to contribute to customer satisfaction and the development of society. Furthermore, with the motto "cutting-edge technology is born from the field," we are adopting a field-oriented approach as our guiding principle and are making daily efforts.
