Suitable for cleaning silicon wafers, photomasks, liquid crystal glass, magnetic disks, etc., cleaning after CMP, and batch-type cleaning.
The "Proximity Type Megasonic PA10-Q60AE-S" is a cleaning unit that emits sound waves at 1.0MHz or 3.0MHz from the nozzle tip. It enables high linearity oscillation from a low output range. Since it cleans very close to the substrate, it can remove sub-micron particles. It allows for liquid supply with a cavitation prevention function and enables a sweeping motion on the substrate, achieving highly reproducible cleaning across the entire substrate. 【Features】 ■ The nozzle material is quartz, which has low particle generation and is durable against chemical solutions. ■ Emits sound waves at 1.0MHz or 3.0MHz from the nozzle tip. ■ Enables high linearity oscillation from a low output range. ■ Cleans very close to the substrate, allowing for the removal of sub-micron particles. *For more details, please download the PDF or feel free to contact us.
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【Other Features】 ■ Capable of liquid supply with a misfire prevention function ■ Can perform a swing-out operation for the substrate, achieving highly reproducible cleaning across the entire substrate *For more details, please download the PDF or feel free to contact us.
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【Usage】 ■ Cleaning of silicon wafers, photomasks, LCD glass, magnetic disks, etc., cleaning after CMP, batch cleaning *For more details, please download the PDF or feel free to contact us.
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Our company develops, designs, manufactures, and sells various equipment tailored to customer applications and manufacturing lines in the semiconductor, photomask, disk, and lens industries. We specialize in customized production based on customer specifications, providing total support for the product lifecycle from design, development, assembly, inspection, installation, to maintenance. By building close relationships with customers at every stage, we can directly sense the issues and technological trends they perceive, allowing us to quickly initiate development in response.