It is possible to evaluate the competitive adsorption of multiple molecules using the focus parameters for film formation (temperature, pressure).
In area-selective atomic layer deposition (AS-ALD), small molecule inhibitors (SMIs) control the surface selectivity of precursor adsorption on the substrate surface. SMIs prevent unwanted deposition on the non-growth surfaces of the substrate and play a crucial role in thin film formation during the deposition process. In this case study, we used the Grand Canonical Monte Carlo (GCMC) method to predict the competitive adsorption amounts of SMIs (aniline, pyridine) and TMA (trimethylaluminum) as single and double molecular species on the Cu(111) surface. This analysis is effective for evaluating adsorption characteristics, including the steric effects of the molecules.
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Measurement Method: Computational Science, AI, Data Analysis Product Areas: Power Devices, LSI, Memory, Manufacturing Equipment, Components Analysis Objectives: Impurity Evaluation, Distribution Evaluation
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Analysis of power devices, LSI, memory, manufacturing equipment, and components.
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Download All Catalogs![[Analysis Case] Competitive Adsorption Analysis of Small Molecule Inhibitors (SMI) and TMA on Cu in AS-ALD Using GCMC Method_C0743](https://image.mono.ipros.com/public/catalog/image/387108/IPROS7609603717424246970.jpeg?w=120&h=170)
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MST is a foundation that provides contract analysis services. We possess various analytical instruments such as TEM, SIMS, and XRD to meet your analysis needs. Our knowledgeable sales representatives will propose appropriate analysis plans. We are also available for consultations at your company, of course. We have obtained ISO 9001 and ISO 27001 certifications. Please feel free to consult us for product development, identifying causes of defects, and patent investigations! MST will guide you to solutions for your "troubles"!
