We recommend a semi-auto coater or auto coater equipped with an automatic dispense function for production!
A "spin coater" is a device used to uniformly apply a photosensitive resin material called resist onto a substrate (such as a silicon wafer). It is basically installed in a clean room, which is a space that is kept clean and maintains a constant temperature and humidity. In some cases, it may also be equipped with mechanisms to locally control the coating environment. [Factors for Uniform Application] ■ Control of Coating Environment - Maintaining a constant temperature and humidity in the coating environment ■ Considerations - Temperature of the wafer - Temperature of the solution - Exhaust flow rate *For more details, please refer to the related links or feel free to contact us.
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Riso Tech Japan, since its establishment, has been a specialist in lithography, providing not only resist exposure/development analysis equipment, resist coaters/developers, and lithography simulators, but also evaluation of exposure/development materials for cutting-edge lithography processes. In particular, for resist processing equipment, we propose optimal specifications tailored to customer needs, adapting spin coaters, developers, bake (PEB) equipment, and film thickness measurement to various fields, ranging from development experimental equipment to fully automated production systems. For example, we offer coating equipment for various substrates such as ultra-thin silicon wafers, various compound semiconductors, quartz, sapphire, and piezoelectric substrates (SAW), including ArF resist, EB resist, high-viscosity thick-film resist, polyimide, insulating films, and wax, as well as development equipment for alkaline, inorganic, and organic materials. Additionally, we provide various process units such as HMDS treatment, vacuum bake, UV irradiation, and high-temperature bake processing.
![[Demo unit available for loan!] Tabletop spin coater](https://image.mono.ipros.com/public/product/image/57e/2000111486/IPROS4737550085534002642.jpg?w=280&h=280)
