The system consists of the main unit, pump unit, and control panel! The chemical supply method is the CCSS method for organic solvent cleaning equipment.
We would like to introduce our "Organic Solvent Cleaning Device." This is an automatic etching cleaning device for 6" wafer cassettes, controlled by a PLC. It consists of the main unit, pump unit, and control panel. The cleaning process is batch cleaning, with a flow direction of left to right using three robotic transports. Please feel free to contact us if you have any inquiries. 【Main Specifications】 ■ Transport: 2 cassette transport for 6" wafers ■ Cleaning Process: Batch cleaning ■ Flow Direction: Left to right with three robotic transports ■ Control Method: PLC ■ Chemical Supply Method: CCSS method *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Process】 ■LD→SOLV.-1→SOLV.-2→N2 bubbling immersion→QDR (O/F) →2-STEPS CASCADE (DI)→F/R→S/D→UL/D *For more details, please refer to the PDF document or feel free to contact us.
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【Usage】 ■ For 6″ wafer cassette *For more details, please refer to the PDF document or feel free to contact us.
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This brand name was chosen to signify the creation of highly unique products with the aim of "EXTENSIVE VISION ON SYSTEM." Current technological innovations are remarkable, and the demands of the times are constantly becoming more advanced. We believe that it is our mission at Zebios to contribute to the industry by consistently proposing differentiated equipment that will revolutionize the now-mature equipment industry.
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