With the same pressure, the water usage is 1/3; with the same flow rate, the pressure is three times higher; and with a lower flow rate, there are repeated impacts. For removing slurry after mask and glass cleaning wafer polishing.
A cleaning nozzle unit that requires less water and is less likely to create a water film, which can be retrofitted to existing equipment. A cleaning nozzle that operates at a maximum of 30Hz. A pump that generates high-pressure water of 5 to 10 MPa. A combination with a control unit. Conventional continuous spraying applies pressure over the water film it creates, leading to an increase in cleaning power, which means higher pressure, increased flow rate, and thicker water film. However, the DP-Gun uses intermittent spraying, resulting in lower flow rates at the same pressure (impact), making it less likely to form a water film and allowing the sprayed water to directly impact the target object. By repeatedly applying intermittent spray impacts, it demonstrates excellent cleaning effects for removing foreign substances from the items being cleaned, cleaning masks, and cleaning three-dimensional objects such as cassettes (with narrow grooves and complex shapes). The pump unit achieves stable water pressure control with minimal waste water during pressure adjustments by performing feedback control in accordance with flow rate changes caused by the opening and closing of the nozzle. *Please consult us regarding spraying a fixed amount of liquid and measuring + spray application. *Nozzles and pumps require regular maintenance.
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【Reference Specifications】 ■DP-Gun 1 unit ・Main body ・Nozzle tip, standard cleaning width of approximately 110mm or approximately 65mm ※1 ■Pump Unit 1 set ・Pump ※1 ・Control unit (built-in driver for 2 DP-Guns) ・Operation panel ・External control compatible (start, stop, alarm output, etc.) ■Settings 1. Pressure (supply pressure 2–10MPa) 2. Frequency (spray frequency 5–30Hz) 3. Pulse width (spray opening time 5–15ms) ※1 The shape of the nozzle tip and pump capacity will be discussed separately based on the purpose of cleaning, required flow rate, and the number of DP-Guns installed. ■Others We can propose solutions based on your requests, including DP-Gun mounting brackets, cleaning tanks, mobile stages, drying with spin air knives, and integration with other cleaning methods (ultrasonic, chemical, etc.). ※ The photo shows an image of multiple DP-Guns connected and our demo unit (with mounting bracket and simple cleaning tank).
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【Applications】 ■ Cleaning various masks - Used as a roller conveyor system - Standalone use (handgun method) ■ Cleaning chip trays - High-pressure pulse jet → US cleaning → Oven drying ■ Cleaning device for seed glass using roller conveyor - Brush → High-pressure pulse jet → Rinse → Air knife drying ■ Cleaning of three-dimensional objects such as wafer cassettes, carriers, carrier cassettes, and chip trays - Cleaning inner and outer surfaces in combination with a multi-joint robot (automating manual work) ■ Strengthening the cleaning power of existing lines - Addition to part of the cleaning tank of existing cleaning devices - Replacement of existing cleaning devices' two-fluid spray
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This brand name was chosen to signify the creation of highly unique products with the aim of "EXTENSIVE VISION ON SYSTEM." Current technological innovations are remarkable, and the demands of the times are constantly becoming more advanced. We believe that it is our mission at Zebios to contribute to the industry by consistently proposing differentiated equipment that will revolutionize the now-mature equipment industry.
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