[Book] Semiconductor Plasma Process Technology (No. 2357)
2357 Semiconductor Plasma
Available for preview - Visualization, Anomaly Detection, High-Precision Process Optimization -
Book Title: Control and Measurement/Monitoring of Semiconductor Plasma Process Technology －－－－－－－－－－－－－－－－－－－－－ ◎ How to achieve optimization of film deposition and etching processes? ◎ Detailed explanation of technologies that visualize plasma and connect to the control of electrons and ions! ◎ Thorough explanation of high-precision process technologies for discharge and reactive plasma! －－－－－－－－－－－－－－－－－－－－－ ■ This book contains the following information: - Techniques for controlling electron density, electron temperature, power control, and gas supply points for discharge plasma and reactive plasma. - Systematization of gas characteristics, exhaust system design technology, measurement technology, and troubleshooting for designing vacuum environments. - Measurement techniques for plasma states using optical emission spectroscopy, quadrupole mass spectrometry, and probe methods. - Measurement of active particle counts, abnormal discharge detection, ion energy distribution, measurement of ion species in plasma, and radical measurement and monitoring technologies. - Low-damage, low-temperature, high-speed film deposition technologies for plasma CVD and ALD processes, control of film density and thickness, and improvement of adhesion. - Film thickness control technologies for sputtering deposition, and control of thin film composition, crystallinity, electrical properties, and mechanical properties.
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- Acceleration of the etching process, reduction of damage, and development of plasma-resistant materials - Mechanisms of particle generation during the process, detection, and countermeasure technologies ---------------------------- ■Table of Contents Chapter 1: Basics of Plasma, Overview of Generation Devices, and Generation/Control Technologies Chapter 2: Design Technologies for Vacuum Environments Chapter 3: Plasma Measurement Technologies, Process Evaluation and Analysis Technologies Chapter 4: Monitoring and Predictive Maintenance Technologies in Plasma Processes Chapter 5: Film Formation Technologies Using Plasma and Low-Temperature Process and Analysis Technologies Chapter 6: Development of Light Sources and Equipment for EUV Lithography Chapter 7: Process Technologies for Plasma Etching and Ashing Chapter 8: Surface Treatment and Cleaning Technologies for Semiconductors Using Plasma ---------------------------- ●Publication Date: June 30, 2026 ●Format: A4 size, 395 pages ●Authors: 41 ●ISBN: 978-4-86798-156-6 ----------------------------
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