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  6. Non-contact tweezers for high-temperature wafers

Non-contact tweezers for high-temperature wafers

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Heat-resistant specification wafer non-contact tweezers

last updated:Mar 02, 2018

ソーラーリサーチ研究所 大阪事業所
ソーラーリサーチ研究所 大阪事業所
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Heat-resistant tweezers for non-contact removal of wafers from a high-temperature susceptor.

A "non-contact tweezers" designed for high-temperature operation that allows for the non-contact removal of wafers from a hot susceptor after epitaxial film deposition on semiconductor wafers using a CVD apparatus. It features a handle equipped with a manual valve, enabling gas supply ON-OFF control through valve operation with a hand holding the handle, similar to using tweezers, while the wafers are suspended and transported by a "float chuck" that holds them non-contact by ejecting gas.

    Other machine elementsCVD EquipmentLaser marker
Hitachi

Non-contact tweezers for high-temperature wafers

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  • Related Link - http://www.solarlab.co.jp/epi

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basic information

A "non-contact tweezers" designed for high temperatures, which uses gas ejection to hold and transport wafers in a suspended manner without contact, is equipped with a handle that has a manual valve. The valve operation is performed by hand using the handle like a pair of tweezers, allowing for ON-OFF control of gas supply to non-contactly remove wafers from a high-temperature susceptor.

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P4

Applications/Examples of results

A "non-contact tweezers" designed for high-temperature operation, which allows for the non-contact removal of wafers from a hot susceptor after epitaxial film formation on semiconductor wafers using a CVD apparatus. It features a handle equipped with a manual valve, enabling gas supply ON-OFF control through valve operation with a hand holding the handle, similar to using tweezers, while suspending and transporting the wafer by blowing gas to maintain a non-contact state.

Company information

ソーラーリサーチ研究所

ソーラーリサーチ研究所 大阪事業所

Electronic Components and Semiconductors

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Manufacturing of non-contact transport devices and application devices for wafers, liquid crystal glass substrates, PDPs, ceramics, printed circuit boards, FPC substrates, films, paper, cloth, etc., using our patented non-contact transport device "Float Chuck" based on the vertical gas jet method developed by our company.

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