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  6. High-speed thermal processing equipment (RTP/RTA) AccuThermo series

High-speed thermal processing equipment (RTP/RTA) AccuThermo series

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AccuThermo Series

last updated:Mar 17, 2016

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High-speed thermal processing equipment (RTP/RTA equipment) AccuThermo series

Desktop-type latest high-speed thermal processing equipment optimal for compound semiconductors such as LEDs and VCSELs, as well as high-speed thermal processing of solar cell wafers. 【Features】 ○ Powerful visible light enables heating treatment of single wafers from 2 inches to 8 inches at controlled temperatures in a short time. ○ Excellent heating uniformity. ○ Advanced temperature control. ○ High-precision temperature measurement using wide-range pyrometer (optional). ○ Closed-loop temperature control using pyrometer or thermocouple temperature sensors. ○ Temperature control range from +100°C to +1,250°C. ○ High-speed heating at 100°C/sec and high-speed cooling at 100°C/sec. ○ High reproducibility of inter-wafer processes. ○ Temperature-time profiles tailored to specific process conditions. ○ Space-saving and high energy efficiency. ● For other functions and details, please contact us.

    Other semiconductor manufacturing equipment
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High-speed thermal processing equipment (RTP/RTA) AccuThermo series

accuthermo.jpg
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  • Related Link - https://www.hisol.jp/products/wall/wall.html

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A desktop-type latest high-speed thermal processing device optimal for high-speed thermal processing of compound semiconductors such as LEDs and VCSELs, as well as solar cell wafers. 【Features】 ○ Powerful visible light enables heating treatment of single wafers from 2 inches to 8 inches at accurately controlled temperatures in a short time. ○ Excellent heating uniformity. ○ Advanced temperature control. ○ High-precision temperature measurement using wide-range pyrometers (optional). ○ Closed-loop temperature control using pyrometers or thermocouple temperature sensors. ○ Temperature control range from +100°C to +1,250°C. ○ High-speed heating at 100°C/sec and high-speed cooling at 100°C/sec. ○ High wafer-to-wafer process reproducibility. ○ Temperature-time profiles tailored to specific process conditions. ○ Space-saving design with high energy efficiency. ● For other functions and details, please contact us.

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【Applications】 ○Compound semiconductors ○Solar cells ○MEMS ○Nanotechnology

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