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  6. LUXEL Corporation manufactured resistance heating evaporation source (evaporator) RADAK

LUXEL Corporation manufactured resistance heating evaporation source (evaporator) RADAK

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last updated:Feb 21, 2011

ラドデバイス
ラドデバイス
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Supports organic material evaporation. A compact and easy-to-handle resistance heating evaporation source.

RADAK is a product offered by LUXEL Corporation for over 30 years. Based on unique design and technology, this product is versatile, easy to operate, and can be used for the deposition of a wide range of materials. By appropriately selecting and combining the materials for the crucible, liners, thermocouples, and other options, it can accommodate various applications such as organic thin-film devices (OLEDs), thin-film batteries, and solar cells. It is particularly recommended for those conducting experiments involving deposition and film formation.

    Evaporation EquipmentOther physicochemical equipmentGlassware and containers
RADAK

LUXEL Corporation manufactured resistance heating evaporation source (evaporator) RADAK

RADAK Furnace_IPROS.JPG
RADAK Furnace_IPROS.JPG
  • Related Link - http://www.rad-dvc.co.jp/product/others/power_c.ht…

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LUXEL, a manufacturer of high-quality thin film filters, offers resistance heating type evaporation sources (evaporators) suitable for vacuum deposition. They are designed with unique features that consider ease of use and performance, making them compatible with existing deposition equipment. Their compact size and ease of handling make them ideal for experimental use. Additionally, you can choose from options such as crucibles, liners, and thermocouples according to your application needs. *Alumina crucibles are provided as standard.* ★ Product Lineup ★ ● RADAK1… Small size (1cc) ● RADAK2… Medium size (10cc) ★ Features ★ - Composed of high-purity metals and ceramics - Resistance heating method using crucibles and W filaments - Safe and high quality - Easy insertion and removal of crucibles with a rotating lock cover - Low thermal loss and low power consumption - Uniform coating distribution - Compatible with a variety of deposition materials ★ Options ★ ● Thermocouples: type K (maximum 1200°C) / C (maximum 1500°C) ● Crucibles: alumina, quartz, and others ● Liners: tungsten, molybdenum, tantalum ● Controllers: three types

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- Vacuum deposition - Thin-film battery - Organic light-emitting diode, etc.

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LUXEL Resistance Heating Vapor Deposition Source RADAK・OLED

LUXEL Resistance Heating Vapor Deposition Source RADAK・OLED

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ラドデバイス

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RAD Device: The name of RAD Device Co., Ltd. is derived from "radiation" and key devices related to it. In physics, "radiation" refers to the process of energy emission such as electromagnetic waves and particles, and the research fields are diverse. Currently, the region of soft X-rays to UV with high energy and short wavelengths is a leading area of cutting-edge technology related to various applications, from astronomical observations to measurement and manufacturing (nanotechnology), where the devices used (such as detection and wavelength selection) play an important role. However, many existing products still face challenges in terms of performance, operability, and environmental resistance, indicating that this is a field where future advancements are expected. RAD Device was established with the aim of contributing to society by timely delivering key devices and related technical information to the research and development sites associated with radiation.

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