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  4. Semiconductor Manufacturing Equipment
  5. Evaporation Equipment
  6. Successful Improvement Case Study 2: Metal Vapor Deposition Cell KMDW-Cell

Successful Improvement Case Study 2: Metal Vapor Deposition Cell KMDW-Cell

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Example 2: Metal Vapor Deposition Cell KMDW-Cell

last updated:Mar 12, 2012

北野精機
北野精機
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Successful Improvement Case Study 2: Metal Vapor Deposition Cell KMDW-Cell

◆◇◆Background◆◇◆ The conventional metal deposition method uses a boat system, applying a large current of over 100A when depositing the metal film. While the boat system allows even beginners to easily perform deposition, the use of high currents is considered a factor that negatively affects the quality of the film. Additionally, the amount of scattering during deposition is significant, requiring frequent maintenance of the chamber, making it difficult to use in a clean environment.

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Successful Improvement Case Study 2: Metal Vapor Deposition Cell KMDW-Cell

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◆◇◆Countermeasures◆◇◆ We proposed a metal deposition cell, the KMDW-Cell. This deposition cell is crucible-type and has the function of depositing by electrically heating a tungsten filament. The crucible capacity is 1cc, making it unsuitable for thick film production, but it is designed for multi-installation in a compact space. By adopting a cold lip method in the crucible configuration, it effectively reduces overflow and spillage caused by material heating. ◆◇◆Results◆◇◆ This unit significantly reduced the operating current to 1/10 compared to the conventional boat-type metal deposition. The deposition rate can be controlled at around 0.1A/s, allowing for precise control. Additionally, the reduction in power consumption to 1/10 has made it possible to minimize damage to organic films caused by heat generation. Furthermore, due to the crucible method, it has a superior directional design, making maintenance easier.

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北野精機

北野精機

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The history of Kitano Seiki is also a trajectory of continuous contribution to cutting-edge research fields through the provision of precision instruments for research and development. In November 1958, we were established as a company specializing in the design, manufacturing, and sales of precision instruments. Since then, we have developed and manufactured experimental equipment aimed at research institutes in universities and government agencies, as well as basic research laboratories in private companies, earning high praise for our excellent quality and reliability. In particular, in recent years, we have been at the forefront of ultra-high vacuum and ultra-low temperature technologies, which are essential in industrial fields such as new materials, nanotechnology, flat panel displays, high-temperature superconductivity, solar cells, nuclear power, and space development. We have accumulated abundant technology and know-how in creating experimental environments and have linked this to the development and provision of equipment that condenses advanced performance and functionality. At Kitano Seiki, we always work closely with researchers, our users, to design and develop equipment that accurately supports research and development objectives. With a consistent system from parts manufacturing to various processing, assembly, inspection and testing, equipment setup, and after-sales support, we provide high-quality products and a conducive experimental environment for quality research and development.

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