A tabletop UV irradiation device that enables advanced cleaning without damaging the sample.
Supports the processing of large substrates. A tabletop UV irradiation device that enables advanced cleaning without damaging the samples. 【Features】 ○ UV irradiation can be performed on substrates (samples) such as silicon wafers and glass with a maximum diameter of 300mm, removing organic substances from the surface and improving wettability. ○ The holder for the substrates (samples) can be easily adjusted or replaced, allowing for the processing of thicker substrates (samples). ○ The ozone-generating device can achieve high cleaning effects by combining treatment with ozone. ○ Automatic operation is possible after setting the substrates (samples). ○ Despite being a tabletop model, it can process large substrates, making it ideal for the development of treatment processes such as surface modification and wafer cleaning. ○ Unlike wet cleaning, it does not produce waste liquid and achieves advanced cleaning effects without causing physical damage to the samples. ○ Organic contaminants are gasified and expelled, preventing re-adhesion of organic contaminants. ● For other functions and details, please download the catalog.
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Supports the processing of large substrates. A tabletop UV irradiation device that enables advanced cleaning without damaging the samples. 【Features】 ○ UV irradiation can be performed on substrates (samples) such as silicon wafers and glass with a maximum diameter of 300mm, removing organic matter from the surface and improving wettability. ○ The vertical adjustment or replacement of the substrate (sample) holder is easy, allowing for the processing of thicker substrates (samples). ○ The ozone-generating device can achieve high cleaning effects by combining ozone treatment. ○ Automatic operation is possible after setting the substrate (sample). ○ Despite being a tabletop model, it can process large substrates, making it ideal for the development of surface modification and wafer cleaning processes. ○ Unlike wet cleaning, it does not produce waste liquid and achieves advanced cleaning effects without causing physical damage to the samples. ○ Organic contaminants are gasified and expelled, preventing re-adhesion of organic contaminants. ● For other functions and details, please download the catalog.
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The name of the new organization, Maple Co., Ltd., which aims to achieve development through a new stage in the field of precision processing and assembly, embodies the fundamental policy of "organizations are people" that has been inherited from the past, as well as the concept of "people think, people create." Make People. "Creating people" along with "people create." This attitude embedded in our company name symbolizes the way we aspire to shape our organization and business in the future.
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