List of Semiconductor Manufacturing Equipment products
- classification：Semiconductor Manufacturing Equipment
91～135 item / All 5179 items
Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!
- Other conveying machines
Ideal for micro-machining! Achieves deburring of holes and double-sided machining in one pass, which was difficult with conventional tools!
- Other machine tools
We will be exhibiting at Mecatronics Tech Japan 2021 from October 20 (Wednesday) to October 23 (Saturday)!
Our company will exhibit at "Mechatrotech Japan 2021," which will be held at Portmesse Nagoya from Wednesday, October 20 to Saturday, October 23, 2021. We will introduce our tools, including the 'Bar Off Tool' capable of chamfering and deburring from a diameter of 0.8 mm, and the 'FEM' tool breakage detection device that reliably detects breakage. We look forward to your visit. (Booth number: 2B12)
Leakage Current Circuit Breaker 【LCB 15mA 100V 15A PSC AAM A】
- Tester
We will provide suitable proposals for the packaging process design that you desire!
- Wafer processing/polishing equipment
- Molding Equipment
- Other semiconductor manufacturing equipment
Supporting the ever-evolving semiconductor applications!
- Other semiconductor manufacturing equipment
- Bonding Equipment
![[Leak Detection] An algorithm for n...](https://image.mono.ipros.com/public/product/image/315214/IPROS12853703792727575734.PNG?w=280&h=280){kind=small}
[Leakage Prevention] Not a single drop of leakage will be overlooked without touching. Move to liquid leakage monitoring without tape.
- Business Intelligence and Data Analysis
- Other measurement, recording and measuring instruments
- Other semiconductor manufacturing equipment
![[Hot Stage] Ultra High Temperature ...](https://image.mono.ipros.com/public/product/image/671/2000002653/IPROS21404174246949592221.png?w=280&h=280){kind=small}
An ultra-high temperature substrate heating stage that allows for substrate elevation, rotation, and RF/DC substrate bias all in one device! 'All-In-One' component.
- Sputtering Equipment
□■□■【Mini-BENCH】Ultra High Temperature Tabletop Experimental Furnace Max 2000℃ □■□■
Tabletop Small-Size Experimental Furnace - Space-Saving, Maximum Operating Temperature 2000℃ ◆ Equipment Configuration ◆ We will propose the desired configuration according to your budget and purpose. (A) Minimum Configuration: Chamber + Temperature Control Unit (B) Above Minimum Configuration (A) + Vacuum Exhaust System (Pump, Gauge, Valve, Vacuum Piping) ◉ Cylindrical Heater: For sintering samples in crucibles (for solid, powder, granule, and pellet-shaped samples) ◉ Flat Heater: For sintering Φ1" to Φ6" wafers and small chip samples ◆ Basic Specifications ◆ - Heater: C/C Composite (Carbon Furnace), Tungsten (Metal Furnace) - Insulation Material: Graphite Felt, Tungsten/Molybdenum - Temperature Control: Programmable Temperature Controller, C Thermocouple - Achievable Vacuum Level: 1x10-2 Pascal (*for an empty furnace) - Power Supply Specifications: AC200V 50/60HZ Three-Phase 6KVA - Cooling Water: 3L/min, 0.4Mpa 25-30℃ ◆ Control Box Specifications ◆ - Programmable Temperature Controller - DC Power Supply Unit or External Transformer Box - Current and Voltage Meters - Heater Circuit Trip Switch - Main Power Switch ◆ Options ◆ - Vacuum Exhaust System - Custom Crucibles and Others
We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.
- Evaporation Equipment
□■□■【Mini-BENCH】Ultra High Temperature Tabletop Experimental Furnace Max 2000℃ □■□■
Tabletop Small-Size Experimental Furnace - Space-Saving, Maximum Operating Temperature 2000℃ ◆ Equipment Configuration ◆ We will propose the desired configuration according to your budget and purpose. (A) Minimum Configuration: Chamber + Temperature Control Unit (B) Above Minimum Configuration (A) + Vacuum Exhaust System (Pump, Gauge, Valve, Vacuum Piping) ◉ Cylindrical Heater: For sintering samples in crucibles (for solid, powder, granule, and pellet-shaped samples) ◉ Flat Heater: For sintering Φ1" to Φ6" wafers and small chip samples ◆ Basic Specifications ◆ - Heater: C/C Composite (Carbon Furnace), Tungsten (Metal Furnace) - Insulation Material: Graphite Felt, Tungsten/Molybdenum - Temperature Control: Programmable Temperature Controller, C Thermocouple - Achievable Vacuum Level: 1x10-2 Pascal (*for an empty furnace) - Power Supply Specifications: AC200V 50/60HZ Three-Phase 6KVA - Cooling Water: 3L/min, 0.4Mpa 25-30℃ ◆ Control Box Specifications ◆ - Programmable Temperature Controller - DC Power Supply Unit or External Transformer Box - Current and Voltage Meters - Heater Circuit Trip Switch - Main Power Switch ◆ Options ◆ - Vacuum Exhaust System - Custom Crucibles and Others
![Soft Etching Device [nanoETCH]](https://image.mono.ipros.com/public/product/image/e80/2000071234/IPROS34856758710167043703.jpeg?w=280&h=280){kind=small}
<30W Low power - Etching control precision 10mW Achieving damage-free and delicate etching processing.
- Etching Equipment
□■□■【Mini-BENCH】Ultra High Temperature Tabletop Experimental Furnace Max 2000℃ □■□■
Tabletop Small-Size Experimental Furnace - Space-Saving, Maximum Operating Temperature 2000℃ ◆ Equipment Configuration ◆ We will propose the desired configuration according to your budget and purpose. (A) Minimum Configuration: Chamber + Temperature Control Unit (B) Above Minimum Configuration (A) + Vacuum Exhaust System (Pump, Gauge, Valve, Vacuum Piping) ◉ Cylindrical Heater: For sintering samples in crucibles (for solid, powder, granule, and pellet-shaped samples) ◉ Flat Heater: For sintering Φ1" to Φ6" wafers and small chip samples ◆ Basic Specifications ◆ - Heater: C/C Composite (Carbon Furnace), Tungsten (Metal Furnace) - Insulation Material: Graphite Felt, Tungsten/Molybdenum - Temperature Control: Programmable Temperature Controller, C Thermocouple - Achievable Vacuum Level: 1x10-2 Pascal (*for an empty furnace) - Power Supply Specifications: AC200V 50/60HZ Three-Phase 6KVA - Cooling Water: 3L/min, 0.4Mpa 25-30℃ ◆ Control Box Specifications ◆ - Programmable Temperature Controller - DC Power Supply Unit or External Transformer Box - Current and Voltage Meters - Heater Circuit Trip Switch - Main Power Switch ◆ Options ◆ - Vacuum Exhaust System - Custom Crucibles and Others
Compact multi-film device that incorporates sputtering, deposition, EB, and annealing thin film modules in a 60L volume chamber, suitable for various applications.
- Sputtering Equipment
- Evaporation Equipment
- CVD Equipment
Sputtering/Dual Chamber System【MiniLab-E080A/S060A】
Two thin-film experimental devices are connected via a load lock mechanism. Different film deposition devices (sputtering - evaporation, etc.) are seamlessly connected through the load lock. With Moorfield's unique load lock system, connections to the left, right, and rear process chambers are also possible (see photo below). 1. MiniLab-E080A (Evaporation Device) - EB Evaporation: 7cc crucible x 6 - Resistance Heating Evaporation x 2 - Organic Evaporation Limit x 2 2. MiniLab-S060A (Sputtering Device) - Φ2" Magnetron Cathode x 4 sources for simultaneous sputtering - Compatible with both DC and RF power supplies 3. Load Lock Chamber - Plasma Etching Stage In the load lock chamber, plasma cleaning of the substrate surface is performed using the "RF/DC substrate bias stage," and the company's unique 'soft etching' technology allows for a <30W low-power, damage-free plasma etching stage. This enables delicate etching processes that are prone to damage, such as 2D (removal of resists like PMMA), graphene delamination, and etching of Teflon substrates. (*This can also be installed in the main chamber stage.)
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
Sputtering/Dual Chamber System【MiniLab-E080A/S060A】
Two thin-film experimental devices are connected via a load lock mechanism. Different film deposition devices (sputtering - evaporation, etc.) are seamlessly connected through the load lock. With Moorfield's unique load lock system, connections to the left, right, and rear process chambers are also possible (see photo below). 1. MiniLab-E080A (Evaporation Device) - EB Evaporation: 7cc crucible x 6 - Resistance Heating Evaporation x 2 - Organic Evaporation Limit x 2 2. MiniLab-S060A (Sputtering Device) - Φ2" Magnetron Cathode x 4 sources for simultaneous sputtering - Compatible with both DC and RF power supplies 3. Load Lock Chamber - Plasma Etching Stage In the load lock chamber, plasma cleaning of the substrate surface is performed using the "RF/DC substrate bias stage," and the company's unique 'soft etching' technology allows for a <30W low-power, damage-free plasma etching stage. This enables delicate etching processes that are prone to damage, such as 2D (removal of resists like PMMA), graphene delamination, and etching of Teflon substrates. (*This can also be installed in the main chamber stage.)
It is possible to generate electrolyzed ionized water using a special electrolytic cell for ultrapure water, which has low electrical conductivity.
- Other semiconductor manufacturing equipment
Automatic separation of water from solvent waste and purification of contained resist components, etc.
- Other semiconductor manufacturing equipment
It can achieve high sensitivity detection for all AMC categories.
- Semiconductor inspection/test equipment
It is an environmentally friendly cleaning device that does not use chemical solutions.
- Other semiconductor manufacturing equipment
A group of trade specialists! We build interactive relationships between the world and Japan.
- Other electronic parts
- Other physicochemical equipment
- Other semiconductor manufacturing equipment
A high-precision sputtering device that contributes to wiring formation.
- Sputtering Equipment
Are you having trouble with the delivery time for cast prototypes? "Casting prototype service!" for cast iron, aluminum castings, and stainless steel castings (lost wax casting)!
- Other semiconductor manufacturing equipment
![[Materials Available!] The Role of ...](https://image.mono.ipros.com/public/product/image/2094225/IPROS15454391273452869385.png?w=280&h=280){kind=small}
"Unseen particles" undermine processing quality. What are the data-driven solutions that successfully achieve precise filtration of brittle materials?
- Grinding Machine
- Wafer processing/polishing equipment
- Other semiconductor manufacturing equipment
The philosophy of the "trinity" that supports precision machining! From "experience" to selection based on "science."
- Grinding Machine
- Other semiconductor manufacturing equipment
- Filtration Equipment
Significantly reduce tact time with continuous dispensing! The ultra-precision dispenser device 'Quspa-LX' enables high-precision fine dispensing.
- Other semiconductor manufacturing equipment
Notice of Exhibited Products and Events for Nepcon Japan 2024
We are pleased to announce that Shinwa will be exhibiting at the Internepcon Japan, which will be held from January 24 to January 26. Date: January 24 (Wed) - January 26 (Fri) 10:00 AM - 5:00 PM Location: Tokyo Big Sight, East Hall 1 Booth Number: [E4-8B] At our booth, we will be showcasing the newly redesigned dispenser device "Quspa-LX" for the first time. You will be able to see a demonstration. Additionally, we will introduce the TXC Corporation's crystal oscillators, which hold the number one global market share, and the CMOS camera modules for automotive applications from the Foxconn Group. On January 25 (Thu), the famous YouTuber Monozukuri Taro will be appearing at our booth! He will clearly explain the appeal of our new products. There will be two sessions on that day, so don't miss this opportunity! Morning: 11:00 AM Afternoon: 3:00 PM We look forward to seeing you there. Please note that pre-registration is required for entry to Internepcon Japan this year. If you have not registered, please do so via the link.
High cleaning performance! The internal structure is very simple with no fluid retention areas! No metal leaching!
- Semiconductor inspection/test equipment
Notice of Participation in the 28th Interphex Japan
We will be exhibiting at the "28th Interphex Japan" trade show, which will be held from May 20 to 22, 2026, featuring auto connectors, automatic piping switching devices, Quitto, and electronic listening rods. At our booth, we will have demonstration units of the auto connectors and automatic piping switching devices, allowing you to see how the connectors automatically align and how the piping is attached and detached. In the Quitto experience corner, you can try out the new product "Quitto" for easy attachment and detachment with just one action. Additionally, we will also display the actual electronic listening rod Kirari MUSE, a diagnostic device that digitizes and visualizes "sound." If you are interested in factory automation, facing challenges with automation, want to eliminate the hassle of Hurel clamps, or are troubled by abnormal sound diagnostics, please stop by. We sincerely look forward to your visit. "28th Interphex Japan" Date: May 20 (Wed), May 21 (Thu), May 22 (Fri), 2026, 10:00 AM - 5:00 PM Venue: Makuhari Messe (Booth Number: 30-27) Exhibits: Auto connectors for powder, automatic piping switching devices, "Quitto," electronic listening rods.
Compact & Resonable for Highend Process !
- Other pumps
- Other semiconductor manufacturing equipment
- Mixer/agitator
Compact & Resonable for Highend Process !
- Other pumps
- Resist Device
- Plating Equipment
An innovative magnetic levitation centrifugal pump that does not use bearings with a lifespan or wear-prone seals!
- Other pumps
- CMP Equipment
- Wafer processing/polishing equipment
Better pump for Better Yields !
- Wafer processing/polishing equipment
- Special Pump
Better pump for Better Yields !
- Special Pump
- Turbo Pump
- CMP Equipment
Continuous manufacturing process of single micron particles (wet adjustment method)
- Lithium-ion battery
- Capacitor
- Other semiconductor manufacturing equipment
Expansion of measurement conditions and built-in 64 LCR meters enable faster and more accurate inspections!
- Tester
- Semiconductor inspection/test equipment
- Circuit Board Inspection Equipment
Supporting the cleaning of pharmaceutical manufacturing environments with electric dust collectors.
- Non-ferrous metals
- Other semiconductor manufacturing equipment