List of Electron beam lithography equipment products
- classification：Electron beam lithography equipment
1～15 item / All 57 items
It won't break even after 1 million repetitions! A mat switch with reliable operation, high durability, and low price. Suitable for options in machine tools as well. Please consult us about delivery t...
- Sensors
We can accommodate high resistance over 10,000 ohms, with diameters ranging from approximately 30 mm to 8 inches, and we also offer thinning and chip processing arrangements!
- Other semiconductors
- Processing Contract
- Wafer
It is a high-precision top-hat beam shaper that is not limited to specific wavelengths, thanks to a smooth aspheric lens.
- Electron beam lithography equipment
We offer a lineup of electron beam lithography systems, ranging from high-precision types with an acceleration voltage of 100 kV to universal types with SEM functionality, capable of meeting various n...
- Electron beam lithography equipment
- Other surface treatment equipment
Aluminum welding: thin plate to thick plate
- Electron beam lithography equipment
![[For the semiconductor industry] Re...](https://image.mono.ipros.com/public/product/image/884/2000678489/IPROS85630803233748329893.png?w=280&h=280){kind=small}
No need to change the size or number of existing bolts? A must-see for those struggling with "wanting to eliminate gas permeation and gas release from vacuum rubber O-rings" in semiconductor manufactu...
- Sealing
- CVD Equipment
- Electron beam lithography equipment
If you want to eliminate gas permeation and gas release with a vacuum rubber O-ring, replace it with a spring-energized C-ring! 'Delta Beta HNRV'
The Delta Beta HNRV is originally designed with a low tightening pressure (Y) HELICOFLEX Delta seal combined with a specially processed internal spring, achieving replacement of rubber O-rings and improved performance. This metal seal is recommended for those who have concerns such as "wanting to eliminate gas permeation and gas release from rubber O-rings" and "unable to change the number or size of bolts on existing flanges." 【Features】 ■ Mainly for ultra-high vacuum use ■ Even lower design tightening pressure than before ■ Can be exchanged with elastomer O-rings ■ Two delta-shaped protrusions on the contact side of the cross-section It does not guarantee compatibility with existing flanges. Specifications for existing flanges are required. *For more details, please download the PDF or feel free to contact us.
Industry high-level high-resolution or high-throughput maskless laser direct writing equipment
- Electron beam lithography equipment
- Other surface treatment equipment
Pursuing line linearity! Generating an ideal top hat beam with uniform illuminance.
- Electron beam lithography equipment
Can be processed into various semiconductor substrates, glass, diamonds, etc.
- Etching Equipment
- Electron beam lithography equipment
- Processing Contract
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
- Electron beam lithography equipment
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
- Electron beam lithography equipment
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and spatial electrification!
- Electron beam lithography equipment
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
- Electron beam lithography equipment
Metal contaminant-free dielectric lining! A compact ECR atomic beam source compatible with ultra-high vacuum equipment.
- Electron beam lithography equipment