List of Heating device products
- classification：Heating device
211～225 item / All 1960 items
Achieves high collection efficiency through electrostatic methods. Offers a wide range of products from large to small sizes. Also compatible with water-soluble oil mist.
- air conditioning
A sheet primarily composed of alkali Earth Silicate fiber (AES fiber/biocompatible soluble fiber), that possesses heat resistance up to approximately 1100°C to 1300°C.
- Ceramics
- Heating device
- Heat exchanger
A roll heating heater with excellent thermal efficiency and temperature uniformity, optimizing the drying process!
- Heating device
- Other heaters
For the adhesive process of non-woven fabric! Roll heating heater with excellent thermal efficiency and uniformity.
- Heating device
- Other heaters
Supports outer diameter sizes from Φ3.1 to over Φ30! Meets the heating needs of experiments.
- Heating device
Contributing to precise temperature control in semiconductor manufacturing!
- Heating device
- Other heaters
Supports outer diameter sizes from Φ3.1 to over Φ30!
- Heating device
Compatible with outer diameter sizes from Φ3.1 to Φ30 and for precise heating.
- Heating device
Optimally manage the temperature of the mold to improve product quality and productivity.
- Heating device
This is a tabletop oven that can be used for a wide range of applications.
- Electric furnace
- Heating device
This is an oven capable of high-temperature treatment under an inert gas atmosphere.
- Electric furnace
- Heating device
The CWF series is a tabletop type research general-purpose chamber furnace. It has a maximum temperature of 1300°C and is available in five different sizes.
- Electric furnace
- Heating device
The RHF series is a chamber furnace that uses silicon carbide heaters.
- Electric furnace
- Heating device
The experimental HTF high-temperature chamber furnace has models at 1700°C and 1800°C.
- Electric furnace
- Heating device
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Free demo units available! Electric heating device for cooking pots using SiC heaters.
- Electric furnace
- Heating device
- Ceramic Heater