List of Electric furnace products
- classification：Electric furnace
46～90 item / All 545 items
Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!
- Other conveying machines
No more need to lift heavy one-gallon cans! Enjoy comfortable liquid transfer in the central kitchen.
- Other Pumps
Decision to exhibit at the 1st Chubu Food Industry Creation Exhibition '26!
We will be exhibiting at the "1st Chubu Food Industry Creation Exhibition '26" to be held at Port Messe Nagoya from November 4 (Wednesday) to November 6 (Friday), 2026. As a new addition to our lineup, we will showcase the "Cordless Sanitary Handy Pump," which is a product we started selling in April last year, alongside our "Compact Sanitary Handy Pump Model MHS." - Cordless! Portable anywhere! Easy to use! Simple cleaning! It is compatible with standard 18L cans and BIB (Bag-in-Box) and features a structure that allows for easy disassembly and cleaning. We would like to invite you to visit us at this opportunity. - Venue: Port Messe Nagoya - Our exhibition booth: Hall 1 "C-66"
Tabletop small-sized experimental furnace - space-saving with a maximum operating temperature of 2000℃! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Annealing furnace
【MiniLab】 Evaporation/Sputtering Dual Chamber System
Two thin film experimental devices are connected by a load lock mechanism. Different film deposition devices (sputtering - evaporation, etc.) are seamlessly connected via the load lock. With Moorfield's unique load lock system, connections to the process chamber on the left, right, and rear are also possible (see photo below). 1. MiniLab-E080A (Evaporation Device) - EB evaporation: 7cc crucible x 6 - Resistance heating evaporation x 2 - Organic evaporation limit x 2 2. MiniLab-S060A (Sputtering Device) - Φ2" Magnetron cathode x 4 for simultaneous sputtering - Compatible with both DC and RF power supplies 3. Load Lock Chamber - Plasma etching stage In the load lock chamber, plasma cleaning of the substrate surface is performed using the "RF/DC substrate bias stage," and the company's unique "soft etching" technology allows for a <30W low-power, damage-free plasma etching stage. This enables delicate etching processes that are prone to damage, such as 2D (removal of resists like PMMA), graphene delamination, and etching of Teflon substrates. (*This can also be installed in the main chamber stage.)
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
☆★☆ Spatter and Vapor Deposition Source Combined Film Formation Device 【nanoPVD-ST15A】 ☆★☆
Sputter Cathode and Co-evaporation Source Mixed Thin Film Experimental Device. Metal deposition, organic deposition, and sputter cathode are installed in a compact frame. A resistance heating evaporation source (for metal deposition), an organic evaporation source (for organic materials), and magnetron sputtering (for metals and insulating materials) are installed in the chamber, allowing for various thin film experimental setups within a single chamber. ◉ Three combinations available: 1. Sputter Cathode + Resistance Heating Evaporation Source x2 2. Sputter Cathode + Organic Evaporation Source x2 3. Sputter Cathode + Resistance Heating Source x1 + Organic Evaporation Source x1 (*DC sputtering only) 【Specifications】 ◉ Compatible substrates: up to Φ4 inches ◉ Sputtering: 2" cathode x up to 3 sources ◉ Vacuum deposition: Resistance heating evaporation (up to 2), organic evaporation (up to 4) ◉ 7" touch panel operation with PLC automatic process control ◉ APC automatic pressure control ◉ 1 line of Ar gas (standard) + expandable with N2, O2 ◉ Connects to a Windows PC via USB for recipe creation and storage. Data logging on PC ◉ Various other options available ◉ Easy operation with a 7" touch panel and PLC automatic process control
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
【MiniLab】 Evaporation/Sputtering Dual Chamber System
Two thin film experimental devices are connected by a load lock mechanism. Different film deposition devices (sputtering - evaporation, etc.) are seamlessly connected via the load lock. With Moorfield's unique load lock system, connections to the process chamber on the left, right, and rear are also possible (see photo below). 1. MiniLab-E080A (Evaporation Device) - EB evaporation: 7cc crucible x 6 - Resistance heating evaporation x 2 - Organic evaporation limit x 2 2. MiniLab-S060A (Sputtering Device) - Φ2" Magnetron cathode x 4 for simultaneous sputtering - Compatible with both DC and RF power supplies 3. Load Lock Chamber - Plasma etching stage In the load lock chamber, plasma cleaning of the substrate surface is performed using the "RF/DC substrate bias stage," and the company's unique "soft etching" technology allows for a <30W low-power, damage-free plasma etching stage. This enables delicate etching processes that are prone to damage, such as 2D (removal of resists like PMMA), graphene delamination, and etching of Teflon substrates. (*This can also be installed in the main chamber stage.)
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.
- Annealing furnace
- Heating device
- Electric furnace
【MiniLab】 Evaporation/Sputtering Dual Chamber System
Two thin film experimental devices are connected by a load lock mechanism. Different film deposition devices (sputtering - evaporation, etc.) are seamlessly connected via the load lock. With Moorfield's unique load lock system, connections to the process chamber on the left, right, and rear are also possible (see photo below). 1. MiniLab-E080A (Evaporation Device) - EB evaporation: 7cc crucible x 6 - Resistance heating evaporation x 2 - Organic evaporation limit x 2 2. MiniLab-S060A (Sputtering Device) - Φ2" Magnetron cathode x 4 for simultaneous sputtering - Compatible with both DC and RF power supplies 3. Load Lock Chamber - Plasma etching stage In the load lock chamber, plasma cleaning of the substrate surface is performed using the "RF/DC substrate bias stage," and the company's unique "soft etching" technology allows for a <30W low-power, damage-free plasma etching stage. This enables delicate etching processes that are prone to damage, such as 2D (removal of resists like PMMA), graphene delamination, and etching of Teflon substrates. (*This can also be installed in the main chamber stage.)
Separable junction. High inverter efficiency of over 97% at all frequencies.
- Electric furnace
- Power Supplies
Max 1000℃, MFC maximum 3 systems, APC pressure control, compatible with 4" or 6" substrates, high vacuum annealing equipment (<5 × 10^-7 mbar)
- Annealing furnace
- Heating device
- Electric furnace
【MiniLab】 Evaporation/Sputtering Dual Chamber System
Two thin film experimental devices are connected by a load lock mechanism. Different film deposition devices (sputtering - evaporation, etc.) are seamlessly connected via the load lock. With Moorfield's unique load lock system, connections to the process chamber on the left, right, and rear are also possible (see photo below). 1. MiniLab-E080A (Evaporation Device) - EB evaporation: 7cc crucible x 6 - Resistance heating evaporation x 2 - Organic evaporation limit x 2 2. MiniLab-S060A (Sputtering Device) - Φ2" Magnetron cathode x 4 for simultaneous sputtering - Compatible with both DC and RF power supplies 3. Load Lock Chamber - Plasma etching stage In the load lock chamber, plasma cleaning of the substrate surface is performed using the "RF/DC substrate bias stage," and the company's unique "soft etching" technology allows for a <30W low-power, damage-free plasma etching stage. This enables delicate etching processes that are prone to damage, such as 2D (removal of resists like PMMA), graphene delamination, and etching of Teflon substrates. (*This can also be installed in the main chamber stage.)
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...
- Evaporation Equipment
- Heating device
- Electric furnace
★★【PyroNFC】Smartphone Configurable Infrared Radiation Temperature Sensor★★
Temperature range, emissivity, alarm, and other parameters can be set using a smartphone or tablet without the need for a display instrument or power supply for the instrument. ● Settings can be made using a smartphone or tablet. ● A dedicated app can be downloaded for free from Google Play (Android 4.1 to 5.1). ● Using Android's NFC communication, simply touch the sensor part to read and write data. ● Ultra-compact sensor (Φ31mm x t29mm) allows temperature measurement in tight spaces. ● Fast response time of 125 msec, high accuracy of ±1.5%. ● Voltage output (0-5V or 0-10V), or K thermocouple output. 【Other Specifications】 ◉ Field of view: 15:1 ◉ Temperature range: 0℃ to 1000℃ ◉ Measurement wavelength range: 8 to 14μm ◉ Emissivity: 0.2 to 1.0 ◉ Power supply: 24VDC (minimum 6V/10V to maximum 28VDC) ◉ Cable: 1m included (extension up to 30m possible) 【Options】 ◉ Body mounting bracket ◉ Extension cable ◉ Air purge kit
High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.
- Evaporation Equipment
- Heating device
- Electric furnace
◆OLED◆ Organic vapor deposition - High-temperature metal evaporation source Max 1500℃
The OLED evaporation source is a high-temperature heating heater for vacuum devices with a maximum operating temperature of 1500°C. It can evaporate materials with high evaporation temperatures, making it suitable for a wide range of applications as a vacuum high-temperature heater and evaporation cell, from low-temperature organic deposition (up to 800°C) cells to high-temperature resistance heating deposition (up to 1500°C) MBE cells. Shutter actuators and water-cooled jackets are also available. High-temperature heaters above 800°C are designed with internal shielding, considering insulation and thermal shielding. 【Main Specifications】 ■ Maximum control temperature: 800°C or 1500°C ■ Operating environment: in vacuum or inert gas (*O2 up to 800°C) ■ Heater: tungsten filament ■ Crucible volume: 1cc (maximum fill volume 1.5cc) ■ Crucible material: alumina ■ Case material: SUS304 or molybdenum ■ Thermocouple: K or C 【Options】 ⚫ Crucible material: PBN, graphite, quartz ⚫ Heater: NiCr wire, Kanthal wire (*for O2) ⚫ Crucible volume: 10cc (maximum fill volume 15cc) ⚫ Shutter: pneumatic or motor-driven ⚫ Water-cooled jacket ⚫ Controller (for heater and shutter control)
Rent an electric furnace with a wide heat distribution area and a temperature control power supply as a set. Payment is based on usage from a period of one month. Click now for more details!
- Electric furnace
For those struggling with heat radiation and heat conduction from the furnace! Achieve both extended equipment lifespan and energy savings through proper material selection and precise processing base...
- Industrial Furnace
- Electric furnace
- Heating device
Packing used around furnace equipment, high-performance fiber products requiring tensile strength.
- Heating device
- Industrial Furnace
- Electric furnace
An ideal insulation material that can be used from -190℃ to 1100℃ and exhibits excellent performance.
- Heating device
- Industrial Furnace
- Electric furnace
It has become possible to manufacture high-performance insulation materials flexibly to match costs.
- Industrial Furnace
- Heating device
- Electric furnace
Experts in high-temperature insulation materials essential for heat treatment! We handle everything from insulation material selection to precision processing. *Free product catalog available (PDF dow...
- Electric furnace
- Heating device
- Industrial Furnace
It is a flexible heater that can meet various needs.
- Industrial Furnace
- Heating device
- Electric furnace
We process all types of insulation boards.
- Industrial Furnace
- Electric furnace
- Heating device
Tabletop small-sized experimental furnace - space-saving, with a maximum operating temperature of 2000°C! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Other heaters
■□【PyroMini】□■ Compact High-Performance Infrared Temperature Sensor
High-performance touch panel converter for easy setup, data logging, and data storage on microSD card. The PM2.2 model can also measure glossy metal surfaces. 【Overview】 With a highly visible high-brightness touch panel display, parameters such as temperature range, emissivity, and sampling rate can be intuitively operated and set. Long-term data storage and management are possible with a microSD card. (*An option for a converter without a display is also available.) The compact sensor head, measuring φ18mm x 45mm, allows for temperature measurement in tight spaces. It employs sensors and cables with excellent noise resistance, making it suitable for integration into moving equipment such as robotic arms. The PM2.2 model uses a short wavelength of 2.2um, supporting high temperatures (Max 2000℃) and measurements of glossy metal material surfaces. 【Features】 ◎ Wide range: -20 to 1000℃ (PM), 100 to 2000℃ (PM2.2) ◎ Excellent basic performance: Accuracy ±1%, reproducibility ±0.5%, 240msec fast response ◎ Measurement wavelength range: 8 to 14μm (PM), 2.0 to 2.2μm (PM2.2) ◎ Compact Φ18mm x 45mm
Rapid heating at approximately 50°C/sec using focused light heating method, with the possibility of rapid cooling when the heating lamp is turned off. Compatible with various atmospheres.
- Electric furnace
Catalog for Budget Application for High-Temperature Heating Furnaces / For budget applications such as development and research expenses
We have lined up the heating observation devices and IR image furnaces from Yokokura Manufacturing, used by various research institutions around the world. ▼ Product Lineup ▼ High-Temperature Furnaces 1. Heating Observation Type "MHO-300-2" - Observe with your microscope! Optional cooling down to -100°C. 2. Compact "IR-TPS" - On-site observation at high temperatures (1500°C) with your microscope. 3. Ultra-High Temperature Heating Type "IR-18SP" - Heats up to high temperatures (1800°C). 4. Compact "IR-TP" - Designed to enable various analyses. 5. Wide-Range High-Temperature Type "IR-QP" - Offers a wide heating range in the IR series, heating up to high temperatures (1700°C). 6. Wide-Range Type "IR-HP" - Offers a wide heating range in the IR series, suitable for heating plates, wafers, substrates, etc. 7. Wide-Range High-Temperature Type "IR-HQ" - A higher model than IR-QP, heats up to high temperatures (1800°C). 8. Large Area "IR-OP" - For simulating various heating conditions. 9. Long-Length Large Area "IR-HP5" - Utilizes specially designed long-length heating lamps. Please check the individual product pages for more details. We also welcome inquiries for customizations tailored to your testing needs, so feel free to contact us.
AGV + hot air circulation batch furnace
- Electric furnace
Please leave the initial consultation for organizing the appropriate electric furnace based on the application, temperature, atmosphere, processing volume, and sample shape to us!
- Electric furnace
- Electric furnace/muffle furnace
Up to 75% Energy Savings: High-Efficiency Rotary Hearth Furnaces with Fixture-Free & Space-Saving Design
- Heating device
- Industrial Furnace
- Electric furnace
Minimize work inside the glove box ◎ Screening of solid electrolyte materials / Impedance evaluation by temperature characteristics ◎ Multiple uniform, short time, and accurate test evaluation
- Lithium-ion battery
- Secondary Cells/Batteries
- Electric furnace
"OCT-equipped heating observation imaging furnace" contributes to global research! Direct observation of internal structural changes at high temperatures.
The "OCT-equipped heating observation furnace" is a compact design that utilizes a focused heating method and is an internal observation device equipped with OCT (Optical Coherence Tomography). Using this device, a research group from Yokohama National University and the Kanagawa Institute of Industrial Science and Technology successfully observed the internal structural changes of ceramics during sintering at high temperatures for the first time in the world. For more details, please refer to the catalog. If you have any questions or inquiries, please feel free to contact us.
Suppressing concerns about degradation and leaks of furnace materials due to corrosive gases, safely examining halogen atmosphere testing.
- Electric furnace
We have reduced waiting time through direct heating with near-infrared radiation, achieving improved productivity in the testing process.
- Heating device
- Electric furnace
- Other heaters
In the newly established laboratory within the company, sample testing and effectiveness verification using superheated steam can be conducted.
- Electric furnace
We would like to introduce some examples of the manufacturing of custom-made heaters by Shinnetsu Industry's superheated steam treatment equipment!
- Heating device
- Electric furnace
- Industrial Furnace
We have a proven track record in various fields such as semiconductors, physical and chemical instruments, and kitchen equipment. Our heater bending technology allows us to design various shapes.
- Other semiconductor manufacturing equipment
- Electric furnace
- Other heaters
The comprehensive catalog has been renewed.
We have renewed our comprehensive catalog to convey our products and services in a clearer and more understandable manner. Our company is a manufacturer that specializes in industrial heaters and machinery equipped with heating components. We deliver customized products tailored to each customer, handling everything from design and manufacturing to sales in-house. We also welcome inquiries about sheath heaters and various consultations regarding heat-related issues, so please feel free to contact us.
Reduce heater capacity by about 10%! Easy maintenance with assembly method.
- Electric furnace
- Industrial Furnace
- Conveyor
Single crystal growth apparatus using the Cz method with high-frequency induction heating.
- Electric furnace
High-temperature wet-type amorphous refractory insulation material from IsoLite Industries, specializing in insulation technology. Not subject to RCF regulations.
- Ceramics
- Industrial Furnace
- Electric furnace
Common operating temperature up to 1100℃, maximum temperature up to 1200℃! The two-tier rack allows for more samples to be arranged.
- Electric furnace
It can handle a common temperature of 700℃ and a maximum temperature of 800℃! It comes with a two-tier sample rack, a tray for loading and unloading, and a handle.
- Electric furnace
The inner wall of the furnace is covered with fused quartz, minimizing the leakage of the introduced gas!
- Electric furnace
Compatible with various diameters of tubes in a single furnace! The work tube itself can be easily replaced.
- Electric furnace
Increasing the surface area of the sample materials exposed to the atmosphere within the work area helps shorten reaction time and improve overall yield!
- Electric furnace
A culmination of thermal engineering accumulated over many years! It helps to increase the surface area of sample materials exposed to the atmosphere inside the container.
- Electric furnace
Industrial production furnace equipped with a collection container! It has three heating zones and is capable of PLC control.
- Electric furnace
25-liter capacity with PLC control! Equipped with an inert gas system and water cooling circuit.
- Electric furnace
It is equipped with stainless steel working pipes and inert gas control! Leave the rotary kiln to us.
- Electric furnace
Equipped with an inert gas control system, it can handle temperatures up to 1500°C!
- Electric furnace
This is a tabletop oven that can be used for a wide range of applications.
- Electric furnace
- Heating device
This is an oven capable of high-temperature treatment under an inert gas atmosphere.
- Electric furnace
- Heating device
How about using it as an electric furnace for high-temperature catalytic chemistry connected to gas chromatography?
- Electric furnace