Last Updated： Aggregation Period:Jul 23, 2025～Aug 19, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Jul 23, 2025～Aug 19, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Jul 23, 2025～Aug 19, 2025
This ranking is based on the number of page views on our site.
496～510 item / All 1047 items
Cleaning equipment, UV/O3 cleaning equipment, dry cleaning equipment, cleaner (cleaning device), stripper (stripping device)
● No vacuum system is required due to atmospheric pressure operation ● Compact design ● Easy to operate and maintain ● Low cost
Dry etching equipment, reactive ion etching equipment, compact etcher, ashing equipment, cleaner (cleaning equipment)
● Only one-touch operation is required, with no special procedures needed. ● It has a small installation space and does not require a specific location. ● It can accommodate samples up to φ4 inches. ● Being a dedicated device, it is low-priced.
It is a batch-type plasma cleaning device (plasma cleaner) suitable for surface modification.
This device allows you to select the processing mode from RIE mode and plasma mode, enabling optimal processing according to the type of substrate. Additionally, it is a very compact tabletop plasma cleaner designed to save space and can be used in various locations.
Achieving safe reduction and cleaning of metal oxide films! Plasma treatment device using water vapor.
The "Aqua Plasma Cleaner" is a plasma treatment device that primarily uses water vapor. It can safely and efficiently perform surface treatments such as the reduction of metal oxide films, cleaning of organic contaminants, photoresist ashing, and hydrophilization. It can be applied to the reduction, modification, and cleaning of silver and copper electrodes, as well as the reduction of other metal oxides, surface modification of resins, hydrophilization, and ashing. 【Features】 ■ Achieves safe reduction and cleaning of metal oxide films ■ Addition of oxygen enables faster cleaning speeds ■ Built-in automatic control system for water vapor generation and supply ■ Dedicated design reduces installation area to 60% of conventional models ■ Supports multi-stage processing (up to 3 stages) *For more details, please refer to the PDF document or feel free to contact us.
