This is an exposure device that has replaced the light source from a mercury lamp to an LED. It features automatic parallel adjustment, complete non-contact gap management, and auto-alignment functions.
This product is an automatic batch equal magnification exposure device (mask aligner) equipped with a UV-LED light source.
One of our features is that it allows for fully non-contact automatic parallel adjustment of the stage and mask for the photomask and wafer.
By incorporating a super-precision UVW drive stage and performing high-performance image processing, the alignment of the photomask and wafer is also carried out accurately.
It supports exposure methods including proximity, soft, and hard contact.
We offer a lineup that matches production volume, from manual machines to fully automatic machines, and since we handle everything from design to manufacturing and sales in-house, we have achieved low prices.
【Features】
■ Compatible with i-line (365nm) and H-line (405nm)! (Please consult us for g-line)
■ Non-contact parallel alignment and exposure of photomask and wafer
■ Auto-alignment function
■ Easy setup change and compatible with multiple substrate sizes
■ Space-saving & easy maintenance
■ Achieves low cost and compact design, suitable for small-batch production of various types
■ Equipped with a super-precision UVW stage
*For more details, please refer to the PDF document or feel free to contact us.
