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Nanopositioner Product List

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Compact 2-Axis Nanopositioner for Optical Adjustment

Compact 2-Axis Nanopositioner for Optical Adjustment

44mm square, maximum stroke of 120µm, high-precision nanopositioner with 0.2nm resolution.

In optical field adjustment work, high-precision positioning of the optical axis is required. Particularly in the arrangement of optical elements that require fine adjustments, even slight positional deviations can cause light loss and measurement errors, affecting the performance and quality of the final product. The XZ/XYZ nanopositioner achieves a compact design with a 44mm square footprint, while providing a maximum stroke of 120µm and a high resolution of 0.2nm. Its zero-backlash flexure guide mechanism enables highly reproducible precise positioning. Furthermore, the adoption of PICMA® piezo actuators ensures high reliability and long lifespan. [Application Scenes] - Adjustment of microscope objective lenses - Fiber alignment - Positioning of optical elements [Benefits of Implementation] - Improved measurement accuracy through high-precision positioning - Increased work efficiency - Stabilization of product quality

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High-Precision Piezo Nano Positioner P-611.1 for Semiconductor Manufacturing

High-Precision Piezo Nano Positioner P-611.1 for Semiconductor Manufacturing

Achieving nanometer precision positioning in a compact and cost-effective manner.

In the semiconductor industry, as manufacturing processes become more advanced, high precision in the positioning of wafers and masks is required. Particularly in fine processing and inspection processes, positioning accuracy at the nanometer level affects product quality. Conventional systems have faced challenges such as large size and high costs. The P-611.1 piezo nano-positioner achieves precise positioning in semiconductor manufacturing at a low cost, with a compact design occupying only 44 x 44 mm, while providing a maximum stroke of 120 μm and a resolution of 0.2 nm. 【Application Scenarios】 - Wafer probing - Mask alignment - Fine processing - Inspection processes 【Benefits of Implementation】 - Improved yield through high-precision positioning - Space-saving due to equipment miniaturization - Enhanced return on investment through cost reduction

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P-611.1 Piezo Nanopositioner for Microscopes

P-611.1 Piezo Nanopositioner for Microscopes

Supports microscope scanning with low cost and compact design.

In scanning applications of microscopes, high precision positioning and stability are required. Especially in the observation and image acquisition of fine structures, accurate position control at the nano level is essential. If the positioning accuracy is low, there is a risk of missing the observation target or reducing the resolution of the images. The P-611.1 piezo nanopositioner is ideal for microscope scanning applications due to its compact design and high precision positioning performance. 【Usage Scenarios】 - Microscope observation - Scanning electron microscopy - Precision positioning of samples 【Benefits of Implementation】 - Improved observation accuracy through high precision positioning - Effective use of installation space due to compact design - Cost-effective implementation

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[Piezonano Positioner P-611.1 for Precision Machinery Assembly]

[Piezonano Positioner P-611.1 for Precision Machinery Assembly]

Ideal for nano-precision assembly that cannot be achieved with conventional motor stages.

In the field of precision machinery assembly, the accurate positioning of components affects the quality of the product. Particularly in the assembly of fine parts, high-precision positioning is required. Low positioning accuracy can lead to product defects and increased assembly time. The P-611.1 piezo nanopositioner, while being low-cost and featuring a compact design of 44 x 44 mm, achieves a resolution of 0.2 nm and a maximum stroke of 120 µm. Its high-speed response due to the piezo actuator enables high-precision and stable positioning at the nanoscale, contributing to the advancement of fine assembly processes. 【Application Scenarios】 - Precise positioning of fine components - High-speed assembly of small parts - High-precision inspection processes 【Benefits of Implementation】 - Improved assembly accuracy - Reduced defect rates - Shortened assembly time

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High-Precision Parallel Kinematics P-733.2 for Semiconductor Manufacturing

High-Precision Parallel Kinematics P-733.2 for Semiconductor Manufacturing

Reproducibility ±1nm, XY axis 100µm stroke. High-precision nanopositioner for semiconductor manufacturing equipment.

In the semiconductor manufacturing field, extremely high precision and stability are required for the positioning of wafers and masks. With the advancement of miniaturization, we have entered an era where nanometer-level positioning errors directly affect device performance and yield. Particularly in exposure and inspection equipment, precise control that combines reproducibility and stability is essential. The P-733.2 achieves high-precision XY nanopositioning with a reproducibility of ±1nm. With a 100µm stroke and a high-rigidity parallel kinematics structure, it is also suitable for integration into semiconductor manufacturing equipment. High-precision positioning contributes to process stabilization and yield improvement. 【Application Scenarios】 - Exposure equipment - Mask/Wafer positioning - Inspection and measurement equipment 【Benefits of Implementation】 - Process stabilization with reproducibility of ±1nm - Yield improvement through high-precision positioning - Maximization of equipment performance through stable operation

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High-precision parallel kinematics for optical adjustment P-733.2

High-precision parallel kinematics for optical adjustment P-733.2

Reproducibility ±1nm, XY axis 100µm stroke. High-precision nanopositioner ideal for transmitted light optical systems.

Precise optical axis adjustment and positioning in the field of optics are crucial elements for maximizing system performance. Especially in high-resolution microscopes and precision measurement devices, even slight positional deviations can significantly impact measurement accuracy and reproducibility. The P-733.2, which employs a high-precision parallel kinematics structure, achieves nano-level positioning with a reproducibility of ±1nm and accommodates transmission light applications with a stroke of 100µm on the XY axis. It contributes to the high precision of optical systems and the efficiency of adjustment tasks, from research and development to device integration. 【Application Scenarios】 - High-precision microscopes - Mask/wafer positioning - Interferometers and optical measurement devices 【Benefits of Implementation】 - High-precision positioning with ±1nm reproducibility - Smooth integration into transmission light optical systems - Reduced optical axis adjustment time and improved development efficiency

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Variable Stroke Multi-Axis Compatible Nanopositioner for Optical Adjustment

Variable Stroke Multi-Axis Compatible Nanopositioner for Optical Adjustment

Ideal for fine-tuning optical systems. High-precision nanopositioner with 0.1 nm resolution.

In optical field adjustment work, even a slight misalignment of the optical axis can significantly impact system performance. Particularly in situations requiring fine positional adjustments, high resolution, excellent linearity, and reproducibility are essential. Inaccurate positioning can lead to a decline in optical performance and measurement errors. This nanopositioner achieves a high resolution of up to 0.1 nm and excellent linearity of 0.02%. Furthermore, it supports variable stroke and multi-axis configurations (X, XY, Z, XYZ), allowing for flexible system construction tailored to specific applications. Direct position measurement using non-contact sensors and zero backlash flexure guides ensure high stability and reproducibility, maximizing the performance of optical systems. [Application Scenarios] - Scanning of microscope samples - Optical alignment - Interferometric measurements [Benefits of Implementation] - Improved optical system performance through high-precision positioning - Enhanced measurement accuracy - Improved work efficiency

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Piezo Nanopositioner for Semiconductor Manufacturing Equipment

Piezo Nanopositioner for Semiconductor Manufacturing Equipment

Compact design with a 44 mm square. Piezo nano-positioning stage achieving a 120 µm operating range and 0.2 nm resolution.

In semiconductor manufacturing processes, precise positioning at the nanometer level is required during wafer processing and inspection stages. Especially in semiconductor processes where miniaturization is advancing, positioning accuracy significantly impacts product quality and yield. The P-611.XZ / P-611.2 is a piezo nano-positioner that achieves a maximum travel range of 120 µm and a high resolution of 0.2 nm, all within a compact design of 44 mm × 44 mm. With its high-precision flexure guide mechanism and PICMA(R) piezo actuators, it enables stable nano-positioning in semiconductor manufacturing and inspection equipment. 【Application Scenarios】 - Semiconductor manufacturing equipment - Wafer inspection equipment - Nano fabrication and micro fabrication equipment - Optical alignment equipment 【Benefits of Implementation】 - Improved yield through nano-level positioning - Enhanced inspection accuracy through high-precision positioning - Easier integration into equipment due to compact design - Stable process control due to high reproducibility

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  • P-611_KUZ_02.jpg
  • Piezoelectric Devices
  • Actuator
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  • Nanopositioner

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