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Thin Film Coating Product List and Ranking from 35 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 10, 2025～Oct 07, 2025
This ranking is based on the number of page views on our site.

Thin Film Coating Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 10, 2025～Oct 07, 2025
This ranking is based on the number of page views on our site.

  1. 東邦化研 Saitama//Electronic Components and Semiconductors
  2. サムコ Kyoto//Industrial Machinery
  3. 吉田ＳＫＴ Aichi//Manufacturing and processing contract
  4. 4 ナノコート・ティーエス 石川事業所 Ishikawa//Manufacturing and processing contract
  5. 5 テルモセラ・ジャパン 本社 Tokyo//Industrial Electrical Equipment
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Thin Film Coating Product ranking

Last Updated： Aggregation Period:Sep 10, 2025～Oct 07, 2025
This ranking is based on the number of page views on our site.

  1. Contract processing service for functional thin films 東邦化研
  2. UV Ozone Cleaner UV-300 サムコ
  3. Celtes X coating for semiconductor mold dies ナノコート・ティーエス 石川事業所
  4. 4 UV Ozone Cleaner UV-1 サムコ
  5. 4 About FHR Anlagenbau GmbH ティー・ケイ・エス

Thin Film Coating Product List

46～60 item / All 70 items

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Sputtering method for various metal films

Sputtering method for various metal films

Sputtering method for various metal thin films

Providing high-performance and high-quality films through the deposition method Various metal thin films handled by the Japan Vacuum Science Institute 【Features】 ○ The deposition method allows for precise control of film thickness, enabling not only full reflection mirror coatings but also half-mirror coatings that transmit part of the incident light. ○ We propose the optimal type of film based on required performance, cost, durability, etc. ○ Product List - Aluminum (Al) The most popular metal film, combining high reflectivity and low cost. - Chromium (Cr) Balances low cost with high durability (corrosion resistance and scratch resistance). - Gold (Au) Exhibits extremely high reflectivity in the infrared range, used in optical devices utilizing infrared light. - Additionally, we can also produce films of alloys such as Inconel, Nichrome, Almel, and Chromel. ● For other functions and details, please download the catalog.

  • others

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Spin spray thin film fabrication device

Spin spray thin film fabrication device

Spin spray thin film production device

Ferrite plating is an innovative technology that allows for the direct fabrication of ferromagnetic ferrite films in aqueous solutions at room temperature to 90°C. Since its invention in 1983 at the Laboratory of Masaki Abe at Tokyo Institute of Technology, it has undergone various improvements, leading to the development of applications in various thin-film magnetic devices and bio-medical devices, some of which have been commercialized. The unique point of the ferrite plating method is that it utilizes the oxidation reaction of Fe2+ ions to Fe, using raw materials such as Fe2+ ions and Ni2+ ions, enabling the creation of various ferrite thin films. The key feature is that the hydroxyl groups on the substrate surface form covalent chemical bonds with metal ions (not just simple physical adsorption), resulting in a strong adhesion.

  • Analytical Equipment and Devices
  • Other laboratory equipment and containers

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Thin Film Manufacturing Device KV-25

Thin Film Manufacturing Device KV-25

SPD method small low-cost film deposition device! Maximum substrate size is 25mm x 25mm.

It is a small, low-cost film deposition device using the SPD method. Maximum substrate size: 25mm x 25mm *For more details, please refer to the catalog or feel free to contact us. This catalog is available in English.

  • Separation device

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UV Ozone Cleaner Rental

UV Ozone Cleaner Rental

We offer rental of UV ozone cleaners for equipment introduction consideration.

We offer rental of small UV cleaning devices. There are unique benefits to renting, such as: - Wanting to use it temporarily for short-term research. - Wanting to thoroughly test the cleaning and modification effects in-house without purchasing. - Unlike purchasing, expenses can be processed, making internal approval relatively easy. - No need for payment of property tax or administrative processing for depreciation.

  • Other surface treatment equipment
  • Surface treatment contract service
  • Ultraviolet irradiation equipment

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Thin Film Manufacturing Device "Nano Film Maker"

Thin Film Manufacturing Device "Nano Film Maker"

It enables control of film thickness on the nanometer order!

The "Nano Film Maker" is a thin film manufacturing device that enables control of film thickness at the nano scale through sensing using quartz crystal microbalance (QCM). This device allows for the development of functional thin films called "alternating adsorption films," which are generated by utilizing the attractive forces between anionic and cationic polymers to adsorb and continuously stack the films. By examining combinations of materials, it can also be useful for the production of conductive films used in touch panels. 【Features】 ■ Achieves film thickness control at the nano scale ■ Allows for free design of heterostructures ■ Capable of accumulating monomers (such as Ru complexes) ■ Various functional thin films can be developed *For more details, please refer to the catalog or feel free to contact us.

  • Company：SNT
  • Price：Other
  • Other Physics and Chemistry Equipment

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Contract processing of high-performance thin films using R.F. ion plating and vacuum deposition.

Contract processing of high-performance thin films using R.F. ion plating and vacuum deposition.

Contract processing of high-performance thin films using R.F. ion plating and vacuum deposition.

From prototype thin film formation to mass production 【Features】 ○ Dense and with minimal changes over time ○ Strong adhesion to the substrate ○ Processing at low temperatures is possible ○ Reactive ion plating is achievable ○ High versatility of film-forming materials ・For more details, please contact us or download the catalog.

  • Surface treatment contract service

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Toho Kaken Co., Ltd. "Coating Contract Processing Achievements"

Toho Kaken Co., Ltd. "Coating Contract Processing Achievements"

Over 30 years dedicated to contract thin film processing! Processing achievements cultivated through rich experience and reliable technology.

We would like to introduce the processing achievements of Toho Kaken Co., Ltd.'s surface treatment thin film coating contract processing services. We have a proven track record in various types of films, including single metal films, oxide films, carbide films, nitride films, alloy films, optical films, and multilayer films (laminated films). 【Applicable Fields】 ■ Electrical and electronic components: electrode films, insulating films, surface protection films, transparent conductive films, etc. ■ Vacuum equipment parts: contamination prevention, insulating films, bonding metals, etc. ■ Aerospace-related: weight reduction, corrosion resistance, solid lubrication, etc. ■ Mechanical parts and molds: wear resistance, release properties, corrosion resistance, surface hardening, etc. For more details, please refer to our catalog or feel free to contact us.

  • Surface treatment contract service

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Thin Film Contract Processing

Thin Film Contract Processing

From prototype development to small-lot production! Surface treatment that transforms parts and materials into multifunctional products.

Toho Kaken Co., Ltd. offers thin film coating services through contract processing, including electron gun vacuum deposition and radio frequency (RF) excited ion plating. In electron gun vacuum deposition, the material to be coated is evaporated using an electron beam gun (EB gun) in a vacuum and then coated onto the target object. Additionally, we also perform RF excited ion plating, which is an advanced version of electron gun vacuum deposition. This method retains the advantages of various evaporation materials while improving adhesion and providing a diversity of conditions. **Features of RF Ion Plating:** - Dense and stable over time - Strong adhesion to substrates - Capable of reactive ion plating - High versatility of coating materials - Diversity of coating conditions For more details, please refer to our catalog or feel free to contact us.

  • Surface treatment contract service

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A free guidebook titled "Thin Film Q&A" with explanations of thin film processing technology is currently available!

A free guidebook titled "Thin Film Q&A" with explanations of thin film processing technology is currently available!

We will give you a free copy of "Thin Film Q&A," which summarizes the differences and characteristics of various coating methods, coating examples, and frequently asked questions!

We are currently offering a free document that explains thin film processing technology, which imparts new functions to materials, in an easy-to-understand Q&A format! - What is vacuum deposition? - What is ion plating? - What kind of films can be created? - What types of coatings can be done? - Is it okay to only do prototypes? Can mass production be done? Toho Chemical Industry Co., Ltd. provides contract processing services for thin film coatings using ion plating (PVD), vacuum deposition, plasma CVD, sputtering, and other suitable surface treatment methods. Since the establishment of our ion plating division, we have accumulated approximately 40 years of achievements across a wide range of fields. We have compiled a list of frequently asked questions. We have summarized the differences and characteristics of each coating method, as well as specific examples of coatings, using illustrations and photos to make it as easy to understand as possible, so please feel free to download it. Based on our flexible response and over 35 years of experience, we will meet your needs! If you are considering functional thin films, please do not hesitate to contact us! If you have any questions, please feel free to reach out to us first!☆

  • Surface treatment contract service
  • Sputtering Equipment
  • Ceramics

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[Coating Example] TiN Film Coating on Silicon Wafer Substrate

[Coating Example] TiN Film Coating on Silicon Wafer Substrate

We would like to introduce a case that can withstand Al sputtering and anodization, and meets the specifications.

We received an inquiry from Tokyo Metropolitan University in Hachioji City regarding their desire to sputter aluminum onto silicon wafer substrates and perform anodic oxidation treatment. They are struggling because the adhesion and characteristics do not meet the required standards. They would like to confirm what changes occur by depositing a TiN film as the initial layer, but since this is a prototype-only project, other companies have declined, and they are having difficulty finding a company that can perform the deposition. It was mentioned that research on thin film electrode layers is being conducted at the university. In cases where a TiN film coating is applied to silicon wafer substrates, there are often instances where it peels off during tape tests, indicating a significant problem with adhesion. Therefore, we proposed performing a binder coat on the initial layer film to improve adhesion before applying the TiN film treatment. *For more details about the case, please refer to the related links. For further inquiries, please feel free to contact us.*

  • Surface treatment contract service

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□■□【MiniLab-026】Flexible Thin Film Experimental Device□■□

□■□【MiniLab-026】Flexible Thin Film Experimental Device□■□

Compact and space-saving! Ideal for research and development. Flexible configuration for purposes such as deposition, sputtering, and annealing.

This is a flexible R&D thin film experimental device that achieves minimal waste, compact size, simple operation, and high cost performance by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug&Play feel. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 4, organic materials x4), and it can also be equipped with a substrate heating stage for annealing and plasma etching. A glove box storage type is also available (*specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Maximum substrate size: Φ6 inch ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 sources) ◉ Organic evaporation source: 1cc or 5cc ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Dry etching ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous deposition from 2 sources, HiPIMS, automatic thin film controller, custom substrate holder, substrate rotation/lifting, substrate heating, and many other options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.

  • Evaporation Equipment
  • Sputtering Equipment
  • Annealing furnace

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◆nanoPVD-T15A◆ High-performance Organic and Metal Film Deposition Equipment

◆nanoPVD-T15A◆ High-performance Organic and Metal Film Deposition Equipment

We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.

High-performance organic source LTE (up to 4 sources) with excellent temperature responsiveness/stability for organic materials such as OLED, OPV, and OTFT, and a metal deposition source TE (up to 2 sources) that allows for easy exchange and maintenance. It can operate in manual mode, as well as in automatic mode for continuous multilayer film deposition and simultaneous film formation. Despite its compact size, it achieves performance comparable to that of large standalone machines without sacrificing basic performance, film quality, uniformity, or operability. Additionally, it features fully automatic control via a simple touch panel with PLC. The user-friendly HMI allows anyone to operate it intuitively without requiring complicated operating procedures. It comes with remote software "IntelliLink," which connects to a Windows PC via USB cable, enabling monitoring of the device's operating status, log saving, online/offline recipe creation and storage, and fault analysis. This compact vacuum deposition system is designed to maximize the effective use of limited development and lab space while also excelling in maintenance.

  • Evaporation Equipment

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Sputtering and deposition source composite thin film deposition device [nanoPVD-ST15A]

Sputtering and deposition source composite thin film deposition device [nanoPVD-ST15A]

Sputter Cathode and Co-evaporation Source Mixed Thin Film Experimental Device: Metal deposition, organic deposition, and sputter cathode installed in a compact frame.

Three types of film formation components are installed in the chamber: resistance heating evaporation source (metal evaporation), organic evaporation source (organic materials), and magnetron sputtering (metal and insulating materials), allowing for various thin film experimental setups to be accommodated within a single chamber. ◉ Three combinations are available: 1. Sputter cathode + resistance heating evaporation source x2 2. Sputter cathode + organic evaporation source x2 3. Sputter cathode + resistance heating source x1 + organic evaporation source x1 (*DC sputtering only) - Evaporation range: Φ4 inch / Φ100 mm - Vacuum exhaust system: Turbo molecular pump + auxiliary pump (rotary or dry scroll pump) - Substrate rotation and vertical lifting stage - Max 500℃ substrate heating heater - Quartz oscillator film thickness sensor - 7” touch panel HMI operation (includes 'IntelliLink' Windows PC remote monitoring software)

  • Sputtering Equipment
  • Evaporation Equipment
  • Annealing furnace

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MiniLab-026/090 Glove Box Thin Film Experiment Device

MiniLab-026/090 Glove Box Thin Film Experiment Device

Compact and space-saving! Ideal for organic thin film development, all processes such as deposition, sputtering, and annealing can be seamlessly performed within the glove box.

In the film formation process of 2D materials such as OLED (Organic EL), OPV (Organic Photovoltaic), OTFT (Organic Thin Film Transistor), graphene, and TMD (Transition Metal Dichalcogenides), it is necessary to handle samples in an inert gas atmosphere isolated from oxygen and moisture. The MiniLab-026/090-GB achieves a "oxygen and moisture-free" experimental environment for organic film applications by housing the PVD chamber within the GB, creating a compact and space-saving environment. 【Features】 ◉ A series of processes such as PVD film formation, spin coating, and hot plate baking can be performed seamlessly within the GB without exposing them to the outside air. ◉ Space-saving: The chamber does not protrude from the back, so it does not take up space. 【MiniLab Models】 ◉ MiniLab-026 (26ℓ volume): Metal/insulator/organic material deposition, sputtering, plasma etching, annealing ◉ MiniLab-090 (90ℓ volume): Metal/insulator/organic material deposition, EB deposition, sputtering, plasma etching, annealing * Please first contact us with your required specifications, and we will configure the system according to your needs.

  • Evaporation Equipment

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□■□【MiniLab-080】Flexible Thin Film Experiment Device□■□

□■□【MiniLab-080】Flexible Thin Film Experiment Device□■□

Flexible configuration available upon request for processes such as evaporation, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during evaporation.

The ML-080, composed of a D-type box chamber with a volume of 80 liters and dimensions of 400(W)x400(D)x570(H)mm, features a higher chamber compared to the 060 model, resulting in a longer TS distance adjustment range and improved film uniformity during deposition on large-diameter substrates. It is an optimal model for vacuum deposition and is a higher-end version of the ML-060, which can also accommodate a load lock mechanism. Like the 060, it is compact yet supports a wide range of applications including resistance heating deposition (for metals, insulators, and organic materials), EB deposition, RF/DC/Pulse DC compatible magnetron sputtering, RIE plasma etching, and annealing. - Maximum substrate size: Φ10 inch - Resistance heating deposition sources: up to 4 sources - Organic deposition sources: up to 4 sources - Magnetron sputtering cathodes: 4 sources - Electron beam deposition - Substrate heating stage (standard 500℃, max 1000℃) - *Plasma etching / <30W soft etching *Plasma etching can be installed in both the main chamber and the load lock chamber.

  • Evaporation Equipment

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