Thin Film Coating Product List and Ranking from 33 Manufacturers, Suppliers and Companies

Evaporation materials / target materials

We offer high-quality products with low impurities! We also accept orders starting from small quantities.

At TDY Corporation, we handle "evaporation materials and target materials." "Evaporation materials" are used in the vacuum deposition method (thermal evaporation), which is one of the technologies for producing thin films, and are generally materials for creating nanometer-scale thin films. Additionally, "target materials," such as sputtering targets, are used in various fields of modern society as thin films. Our company provides high-quality and short-delivery Ge and Si targets. 【Product Details】 <Evaporation Materials: Ge Evaporation Material> ■ Ge Granular D - Purity: 6N or higher - Size: 2mm to 8mm ■ Ge Granular C - Purity: 6N or higher - Size: 3mm to 6mm *We also handle overseas products. *For more details, please refer to the PDF document or feel free to contact us.

Company：ティーディーワイ
Price：Other

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Introduction to Thin Film Coating Processing Technology

Thin film coating that can coat most metals, metal oxides, and dielectric films!

Our company offers film deposition processing using PVD techniques, including resistance heating vacuum deposition, EB heating vacuum deposition, and sputtering methods. By utilizing these processing technologies, we can coat almost all metals, metal oxides, and dielectric films. Please feel free to consult us if you have any requests. 【Features】 ■ Film deposition processing is possible using resistance heating vacuum deposition, EB heating vacuum deposition, and sputtering methods. ■ Coating of almost all metals, metal oxides, and dielectric films is possible. *For more details, please refer to our catalog or feel free to contact us.

Company：フォトプレシジョン
Price：Other

Technology Development
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Vacuum electron staining device for electron microscope samples

Short dyeing time allows for deep coloring! Safely and effectively reproduce electron staining for SEM and TEM samples!

This product is a vacuum electron staining device that adopts a new staining method by placing a sample in a vacuum chamber and introducing osmium tetroxide gas or ruthenium tetroxide gas into the vacuum chamber for staining. Since staining is performed in a vacuum-sealed environment, it reduces operational errors through automation and interlocks. Additionally, the amount of staining gas introduced can be controlled. After staining is completed, re-evacuation is performed to prevent overstaining. 【Features】 ■ Effective for hygroscopic samples ■ Short staining time with deep staining possible ■ Reduction of surface contamination ■ Easier to find optimal conditions (only for model VSC4TWDH) ■ Staining possible without exposure to the atmosphere (when using optional middle chamber or mini chamber) *For more details, please refer to the PDF materials or feel free to contact us.

Company：フィルジェン
Price：Other

Analytical Equipment and Devices
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Conductive film production device "Osmium Plasma Coater"

Solve your problems with electron microscope observation! It is highly effective in preventing charge-up and reducing granularity and thermal damage.

The "Osmium Plasma Coater" is a device for producing conductive thin films for electron microscope samples using the "plasma film formation method in the negative glow region by direct current glow discharge." With the plasma CVD method, amorphous osmium conductive thin films (osmium coating) can be formed in a short time. A highly robust and smooth conductive thin film can be obtained without causing thermal damage to the sample. 【Features】 ■ Fully automatic operation ■ Detachable osmium sublimation chamber/ naphthalene sublimation chamber ■ Ability to check the remaining amount of osmium/naphthalene ■ Short film formation time (a few nm/ a few seconds) ■ Ampoule has a safe structure that breaks inside the sublimation chamber *For more details, please refer to the PDF document or feel free to contact us.

Company：フィルジェン
Price：Other

Analytical Equipment and Devices
Thin Film Coating

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UV Ozone Cleaner

Removal of organic pollutants with the double effect of ultraviolet light and ozone from two wavelengths!

The "UV Ozone Cleaner" is a damage-free dry cleaning method that can remove organic contaminants adhering to substrates through a photochemical oxidation decomposition process. It features a reliable sealed structure that can maintain a pressurized state of 0.02 MPa inside the cleaning chamber. Additionally, by connecting to the standard ozone killer (ozone decomposition device) equipped in other models, it prevents ozone leakage to the outside. 【Features】 ■ Easily removes organic contaminants on substrates that could not be removed by ultrasonic cleaning alone ■ Removes organic solvents used in wet cleaning ■ Capable of removing organic contaminants without damaging the substrate surface ■ Facilitates the formation of thin films ■ A dry cleaning device that can be used at atmospheric pressure without the need for a vacuum device *For more details, please refer to the PDF materials or feel free to contact us.

Company：フィルジェン
Price：Other

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Sputtering method for various metal films

Sputtering method for various metal thin films

Providing high-performance and high-quality films through the deposition method Various metal thin films handled by the Japan Vacuum Science Institute 【Features】 ○ The deposition method allows for precise control of film thickness, enabling not only full reflection mirror coatings but also half-mirror coatings that transmit part of the incident light. ○ We propose the optimal type of film based on required performance, cost, durability, etc. ○ Product List - Aluminum (Al) The most popular metal film, combining high reflectivity and low cost. - Chromium (Cr) Balances low cost with high durability (corrosion resistance and scratch resistance). - Gold (Au) Exhibits extremely high reflectivity in the infrared range, used in optical devices utilizing infrared light. - Additionally, we can also produce films of alloys such as Inconel, Nichrome, Almel, and Chromel. ● For other functions and details, please download the catalog.

Company：日本真空科学研究所
Price：Other

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Spin spray thin film fabrication device

Spin spray thin film production device

Ferrite plating is an innovative technology that allows for the direct fabrication of ferromagnetic ferrite films in aqueous solutions at room temperature to 90°C. Since its invention in 1983 at the Laboratory of Masaki Abe at Tokyo Institute of Technology, it has undergone various improvements, leading to the development of applications in various thin-film magnetic devices and bio-medical devices, some of which have been commercialized. The unique point of the ferrite plating method is that it utilizes the oxidation reaction of Fe2+ ions to Fe, using raw materials such as Fe2+ ions and Ni2+ ions, enabling the creation of various ferrite thin films. The key feature is that the hydroxyl groups on the substrate surface form covalent chemical bonds with metal ions (not just simple physical adsorption), resulting in a strong adhesion.

Company：北野精機
Price：Other

Analytical Equipment and Devices
Other laboratory equipment and containers
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Thin Film Manufacturing Device KV-25

SPD method small low-cost film deposition device! Maximum substrate size is 25mm x 25mm.

It is a small, low-cost film deposition device using the SPD method. Maximum substrate size: 25mm x 25mm *For more details, please refer to the catalog or feel free to contact us. This catalog is available in English.

Company：SPD研究所
Price：Other

Separation device
Thin Film Coating

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UV Ozone Cleaner Rental

We offer rental of UV ozone cleaners for equipment introduction consideration.

We offer rental of small UV cleaning devices. There are unique benefits to renting, such as: - Wanting to use it temporarily for short-term research. - Wanting to thoroughly test the cleaning and modification effects in-house without purchasing. - Unlike purchasing, expenses can be processed, making internal approval relatively easy. - No need for payment of property tax or administrative processing for depreciation.

Company：あすみ技研
Price：Other

Other surface treatment equipment
Surface treatment contract service
Ultraviolet irradiation equipment
Thin Film Coating

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Thin Film Manufacturing Device "Nano Film Maker"

It enables control of film thickness on the nanometer order!

The "Nano Film Maker" is a thin film manufacturing device that enables control of film thickness at the nano scale through sensing using quartz crystal microbalance (QCM). This device allows for the development of functional thin films called "alternating adsorption films," which are generated by utilizing the attractive forces between anionic and cationic polymers to adsorb and continuously stack the films. By examining combinations of materials, it can also be useful for the production of conductive films used in touch panels. 【Features】 ■ Achieves film thickness control at the nano scale ■ Allows for free design of heterostructures ■ Capable of accumulating monomers (such as Ru complexes) ■ Various functional thin films can be developed *For more details, please refer to the catalog or feel free to contact us.

Company：SNT
Price：Other

Other Physics and Chemistry Equipment
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Contract processing of high-performance thin films using R.F. ion plating and vacuum deposition.

From prototype thin film formation to mass production 【Features】 ○ Dense and with minimal changes over time ○ Strong adhesion to the substrate ○ Processing at low temperatures is possible ○ Reactive ion plating is achievable ○ High versatility of film-forming materials ・For more details, please contact us or download the catalog.

Company：東邦化研
Price：Other

Surface treatment contract service
Thin Film Coating

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Toho Kaken Co., Ltd. "Coating Contract Processing Achievements"

Over 30 years dedicated to contract thin film processing! Processing achievements cultivated through rich experience and reliable technology.

We would like to introduce the processing achievements of Toho Kaken Co., Ltd.'s surface treatment thin film coating contract processing services. We have a proven track record in various types of films, including single metal films, oxide films, carbide films, nitride films, alloy films, optical films, and multilayer films (laminated films). 【Applicable Fields】 ■ Electrical and electronic components: electrode films, insulating films, surface protection films, transparent conductive films, etc. ■ Vacuum equipment parts: contamination prevention, insulating films, bonding metals, etc. ■ Aerospace-related: weight reduction, corrosion resistance, solid lubrication, etc. ■ Mechanical parts and molds: wear resistance, release properties, corrosion resistance, surface hardening, etc. For more details, please refer to our catalog or feel free to contact us.

Company：東邦化研
Price：Other

Surface treatment contract service
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Thin Film Contract Processing

From prototype development to small-lot production! Surface treatment that transforms parts and materials into multifunctional products.

Toho Kaken Co., Ltd. offers thin film coating services through contract processing, including electron gun vacuum deposition and radio frequency (RF) excited ion plating. In electron gun vacuum deposition, the material to be coated is evaporated using an electron beam gun (EB gun) in a vacuum and then coated onto the target object. Additionally, we also perform RF excited ion plating, which is an advanced version of electron gun vacuum deposition. This method retains the advantages of various evaporation materials while improving adhesion and providing a diversity of conditions. **Features of RF Ion Plating:** - Dense and stable over time - Strong adhesion to substrates - Capable of reactive ion plating - High versatility of coating materials - Diversity of coating conditions For more details, please refer to our catalog or feel free to contact us.

Company：東邦化研
Price：Other

Surface treatment contract service
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A free guidebook titled "Thin Film Q&A" with explanations of thin film processing technology is currently available!

We will give you a free copy of "Thin Film Q&A," which summarizes the differences and characteristics of various coating methods, coating examples, and frequently asked questions!

We are currently offering a free document that explains thin film processing technology, which imparts new functions to materials, in an easy-to-understand Q&A format! - What is vacuum deposition? - What is ion plating? - What kind of films can be created? - What types of coatings can be done? - Is it okay to only do prototypes? Can mass production be done? Toho Chemical Industry Co., Ltd. provides contract processing services for thin film coatings using ion plating (PVD), vacuum deposition, plasma CVD, sputtering, and other suitable surface treatment methods. Since the establishment of our ion plating division, we have accumulated approximately 40 years of achievements across a wide range of fields. We have compiled a list of frequently asked questions. We have summarized the differences and characteristics of each coating method, as well as specific examples of coatings, using illustrations and photos to make it as easy to understand as possible, so please feel free to download it. Based on our flexible response and over 35 years of experience, we will meet your needs! If you are considering functional thin films, please do not hesitate to contact us! If you have any questions, please feel free to reach out to us first!☆

Company：東邦化研
Price：Other

Surface treatment contract service
Sputtering Equipment
Ceramics
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□■□【MiniLab-026】Flexible Thin Film Experimental Device□■□

Compact and space-saving! Ideal for research and development. Flexible configuration for purposes such as deposition, sputtering, and annealing.

This is a flexible R&D thin film experimental device that achieves minimal waste, compact size, simple operation, and high cost performance by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug&Play feel. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 4, organic materials x4), and it can also be equipped with a substrate heating stage for annealing and plasma etching. A glove box storage type is also available (*specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Maximum substrate size: Φ6 inch ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 sources) ◉ Organic evaporation source: 1cc or 5cc ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Dry etching ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous deposition from 2 sources, HiPIMS, automatic thin film controller, custom substrate holder, substrate rotation/lifting, substrate heating, and many other options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.

Company：テルモセラ・ジャパン本社
Price：Other

Evaporation Equipment
Sputtering Equipment
Annealing furnace
Thin Film Coating

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◆nanoPVD-T15A◆ High-performance Organic and Metal Film Deposition Equipment

We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.

High-performance organic source LTE (up to 4 sources) with excellent temperature responsiveness/stability for organic materials such as OLED, OPV, and OTFT, and a metal deposition source TE (up to 2 sources) that allows for easy exchange and maintenance. It can operate in manual mode, as well as in automatic mode for continuous multilayer film deposition and simultaneous film formation. Despite its compact size, it achieves performance comparable to that of large standalone machines without sacrificing basic performance, film quality, uniformity, or operability. Additionally, it features fully automatic control via a simple touch panel with PLC. The user-friendly HMI allows anyone to operate it intuitively without requiring complicated operating procedures. It comes with remote software "IntelliLink," which connects to a Windows PC via USB cable, enabling monitoring of the device's operating status, log saving, online/offline recipe creation and storage, and fault analysis. This compact vacuum deposition system is designed to maximize the effective use of limited development and lab space while also excelling in maintenance.

Company：テルモセラ・ジャパン本社
Price：Other

Evaporation Equipment
Thin Film Coating

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Sputtering and deposition source composite thin film deposition device [nanoPVD-ST15A]

Sputter Cathode and Co-evaporation Source Mixed Thin Film Experimental Device: Metal deposition, organic deposition, and sputter cathode installed in a compact frame.

Three types of film formation components are installed in the chamber: resistance heating evaporation source (metal evaporation), organic evaporation source (organic materials), and magnetron sputtering (metal and insulating materials), allowing for various thin film experimental setups to be accommodated within a single chamber. ◉ Three combinations are available: 1. Sputter cathode + resistance heating evaporation source x2 2. Sputter cathode + organic evaporation source x2 3. Sputter cathode + resistance heating source x1 + organic evaporation source x1 (*DC sputtering only) - Evaporation range: Φ4 inch / Φ100 mm - Vacuum exhaust system: Turbo molecular pump + auxiliary pump (rotary or dry scroll pump) - Substrate rotation and vertical lifting stage - Max 500℃ substrate heating heater - Quartz oscillator film thickness sensor - 7” touch panel HMI operation (includes 'IntelliLink' Windows PC remote monitoring software)

Company：テルモセラ・ジャパン本社
Price：Other

Sputtering Equipment
Evaporation Equipment
Annealing furnace
Thin Film Coating

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MiniLab-026/090 Glove Box Thin Film Experiment Device

Compact and space-saving! Ideal for organic thin film development, all processes such as deposition, sputtering, and annealing can be seamlessly performed within the glove box.

In the film formation process of 2D materials such as OLED (Organic EL), OPV (Organic Photovoltaic), OTFT (Organic Thin Film Transistor), graphene, and TMD (Transition Metal Dichalcogenides), it is necessary to handle samples in an inert gas atmosphere isolated from oxygen and moisture. The MiniLab-026/090-GB achieves a "oxygen and moisture-free" experimental environment for organic film applications by housing the PVD chamber within the GB, creating a compact and space-saving environment. 【Features】 ◉ A series of processes such as PVD film formation, spin coating, and hot plate baking can be performed seamlessly within the GB without exposing them to the outside air. ◉ Space-saving: The chamber does not protrude from the back, so it does not take up space. 【MiniLab Models】 ◉ MiniLab-026 (26ℓ volume): Metal/insulator/organic material deposition, sputtering, plasma etching, annealing ◉ MiniLab-090 (90ℓ volume): Metal/insulator/organic material deposition, EB deposition, sputtering, plasma etching, annealing * Please first contact us with your required specifications, and we will configure the system according to your needs.

Company：テルモセラ・ジャパン本社
Price：Other

Evaporation Equipment
Thin Film Coating

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□■□【MiniLab-080】Flexible Thin Film Experiment Device□■□

Flexible configuration available upon request for processes such as evaporation, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during evaporation.

The ML-080, composed of a D-type box chamber with a volume of 80 liters and dimensions of 400(W)x400(D)x570(H)mm, features a higher chamber compared to the 060 model, resulting in a longer TS distance adjustment range and improved film uniformity during deposition on large-diameter substrates. It is an optimal model for vacuum deposition and is a higher-end version of the ML-060, which can also accommodate a load lock mechanism. Like the 060, it is compact yet supports a wide range of applications including resistance heating deposition (for metals, insulators, and organic materials), EB deposition, RF/DC/Pulse DC compatible magnetron sputtering, RIE plasma etching, and annealing. - Maximum substrate size: Φ10 inch - Resistance heating deposition sources: up to 4 sources - Organic deposition sources: up to 4 sources - Magnetron sputtering cathodes: 4 sources - Electron beam deposition - Substrate heating stage (standard 500℃, max 1000℃) - *Plasma etching / <30W soft etching *Plasma etching can be installed in both the main chamber and the load lock chamber.

Company：テルモセラ・ジャパン本社
Price：Other

Evaporation Equipment
Thin Film Coating

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□■□【MiniLab-090】Flexible Thin Film Experimental Device□■□

Storage-compatible glove box PVD flexible thin film experimental device, featuring a tall chamber with a height of 570mm, contributes to improved uniformity during deposition.

MiniLab-080 is a glove box model designed to accommodate an 80ℓ large volume chamber within a glove box bench. It features a slide-open and close chamber that maximizes the use of the workbench, and a rear-opening door designed with maintenance in mind. Samples processed can be consistently handled in a controlled environment inside the glove box without exposure to the atmosphere or moisture. For specifications of the GB model, please refer to the gas purification unit. - Maximum substrate size: Φ10 inch - Resistance heating evaporation source x up to 4 sources - Organic evaporation source x up to 4 sources - Magnetron sputtering cathode x 4 sources - Electron beam evaporation - Substrate heating stage (standard 500℃, Max 1000℃) - Plasma etching / <30W soft etching

Company：テルモセラ・ジャパン本社
Price：Other

Evaporation Equipment
Sputtering Equipment
Etching Equipment
Thin Film Coating

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KBM processing thin film coating

Matte black fluoropolymer coating primarily composed of PTFE.

KBM processing thin film coating is a matte black fluoropolymer coating primarily composed of PTFE. It not only has water-repellent properties but also achieves a high contact angle against solvents such as thinners. It is suitable for applications where you want to improve the lubrication of parts, enhance the water-repellent properties of components, prevent defects due to reflection, apply a coating that does not peel off when bending parts, and increase the chemical resistance of components. For more details, please contact us or download the catalog.

Company：熊防メタル
Price：Other

Processing Contract
Surface treatment contract service
Other semiconductor manufacturing equipment
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Metal mirror

The specification angle ranges from 0 degrees to 90 degrees! It is relatively low-cost, highly versatile, and compatible with various wavelength ranges.

"Metal mirrors" are products that have aluminum or gold applied to glass. They are relatively low-cost, highly versatile, and can accommodate various wavelength ranges. The main wavelength ranges are from the ultraviolet range (200nm) to the visible range to the infrared range, with specification angles from 0 degrees to 90 degrees. Our company can provide highly durable products through coating (vacuum deposition). [Main glass materials] ■ General optical glass ■ Synthetic quartz ■ Optical crystals (Si・Ge) ■ Colored glass ■ Resin *For more details, please refer to the PDF document or feel free to contact us.

Company：大正光学
Price：Other

mirror
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Technical Data: Possibilities of Thin Film Production Using Excimer Lamps

Utilizing high-output xenon excimer lamps! Introduction to the film deposition rate of the light CVD method.

By forming a thin film on the surface of metals and polymer materials, it is possible to control the mechanical, thermal, chemical, and electrical properties of the material's surface. Various methods are employed for the film formation of thin films used in this surface modification, including vacuum deposition, PVD, and plasma CVD methods. It is expected that the exploration and development of new film formation methods will continue in the future. In this document, we present the results of our examination of the potential of a thin film manufacturing process using a "high-output xenon excimer lamp." [Contents] ■ Introduction ■ Film formation speed of the photochemical CVD method using a "high-output xenon excimer lamp" ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.

Company：クォークテクノロジー
Price：Other

Ultraviolet irradiation equipment
Thin Film Coating

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Super Hard Thin Film Coating "CERTESS NITRO"

Ultra-hard thin film coating that improves wear resistance! No polishing process is required after film formation.

"CERTESS NITRO" is a super-hard thin film coating for mechanical parts formed by physical vapor deposition. Thanks to its unique technology, the coating surface is extremely smooth, eliminating the need for any polishing process after film formation. Additionally, the coefficient of friction is significantly reduced, and resistance to corrosive wear, abrasive wear, and adhesive wear is greatly improved. It is utilized in a wide range of fields, including the aerospace industry, automotive parts, and medical device components. 【Features】 ■ Formed by PVD (Physical Vapor Deposition) ■ No polishing process required after film formation ■ Significant reduction in coefficient of friction ■ Improved resistance to corrosive wear, abrasive wear, and adhesive wear *For more details, please refer to the catalog. Feel free to contact us with any inquiries.

Company：HEF DURFERRIT JAPAN
Price：Other

Processing Contract
Thin Film Coating

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AR mirror, metal film, optical thin film, decoration, embellishment, water-repellent, dirt-resistant, anti-fog.

We will respond to your requests for high precision, short delivery times, and small quantities of various products!

Wako Kogyo Co., Ltd. is a company primarily engaged in thin film processing of glass products. We contribute to the development of cutting-edge information devices with our thin film coating technology. Additionally, we respond meticulously to various customer requests, such as high precision, short delivery times, and small quantities of diverse products. We meet your trust with advanced equipment such as vacuum deposition devices, measuring instruments, and environmental testing machines. 【Main Business Activities】 ■ Thin film processing of glass products *For more details, please refer to our catalog or feel free to contact us.*

Company：和絋工業
Price：Other

Processing Contract
Contract manufacturing
filter
Thin Film Coating

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About FHR Anlagenbau GmbH

Introducing FHR, which offers excellent technical capabilities and high-quality bonded sputtering targets!

FHR Anlagenbau GmbH is an innovative company in the field of vacuum processes and thin film technology. It was established in 1991 in Dresden, Germany, by a group of engineers with excellent technical skills aimed at developing and selling new concepts and solutions for multiple applications of thin films. FHR provides thin film technology and offers customized equipment for a wide range of applications to customers worldwide. [Included in the FHR Technology Portfolio] ■ Advanced metallization technology through magnetron sputtering and CVD ■ Reactive sputtering technology for the deposition of oxides and nitrides ■ Advanced etching technology supported by high-density plasma sources ■ Flash lamp annealing (FLA) for processing and modifying semiconductors, metals, ceramics, nanostructures, and photonic materials ■ Atomic layer deposition (ALD) technology for single-layer bonding with excellent uniformity through advanced film deposition control on complex 3D shapes *For more details, please refer to the PDF document or feel free to contact us.

Company：ティー・ケイ・エス
Price：Other

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Thin film coating: "Ultra-thin film processing with excellent water and oil repellency."

A thin film coating with excellent precision, visible light transmittance, water repellency, and oil repellency. Technical materials summarizing the new series are currently being presented.

The "Nano Process TC-10S" enables thin film coatings of less than 100μm and excels in precision, visible light transmittance, water repellency, and oil repellency. It can maintain optical properties with minimal dimensional changes, making it possible to process "precision parts" and in fields that require high dimensional and surface accuracy, where fluororesin coatings have been difficult until now. <Examples of Applications> - Sealing and water-repellent treatment for electronic devices and components - Water repellency for optical lenses - Prevention of oil diffusion in bearing components - Prevention of oil sludge in sealing components, etc. Additionally, Nano Process has been renewed with three other new features, each with different characteristics and applications. 【Features of Each Series】 ■ TLS Series Excellent non-adhesiveness to sticky substances like tape ■ NCFPC Series Excellent liquid repellency for water and oil ■ HP Series Excellent hydrophilicity Currently, we are offering technical materials summarizing the details of each series. If you are interested in more details or are facing challenges with surface treatment in precision fields, please download the materials or contact us directly.

Company：吉田ＳＫＴ
Price：Other

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Thin Film Coating: "Thin Film Fluorine Coat with Excellent Liquid Slip Properties"

Super-thin film coating with excellent water and oil repellency!

The "Nano Process NCFPC Series" is an ultra-thin film fluorine coating that excels in liquid repellency, such as water and oil, compared to fluorine resin coatings, and improves liquid drainage and flow. It causes almost no dimensional changes and can maintain optical properties, making it possible to process "precision parts" and in fields that require high dimensional and surface accuracy, where fluorine resin coatings have been difficult until now. <Examples of Applications> - Improvement of liquid drainage for water and oil - Improvement of liquid flow for water and oil - Prevention of oil diffusion in bearing components, etc. Additionally, Nano Process has been renewed with three other new functions, each with different features and applications. 【Features of Each Series】 ■ TC-10S Excellent precision, visible light transmittance, water repellency, and oil repellency ■ TLS Series Superior non-stick properties against adhesive materials like tape ■ HP Series Excellent hydrophilicity Currently, we are offering technical materials summarizing the details of each series. If you are interested in more details or are facing challenges with surface treatment in the precision field, please download the materials or contact us directly.

Company：吉田ＳＫＴ
Price：Other

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Thin film coating: "Thin film treatment with excellent hydrophilicity"

The "Nano Process HP Series" can impart hydrophilicity through thin film coating, demonstrating effectiveness in anti-fogging and dirt resistance.

The "Nano Process HP Series" excels in hydrophilicity and contributes to anti-fogging, anti-soiling, moisture resistance, and rust prevention through its thin film coating. It causes almost no dimensional changes and maintains optical properties, enabling processing in fields where coating has been difficult, such as "precision parts" and "areas requiring high dimensional and surface accuracy." <Examples of Applications> - Anti-soiling for parts and equipment - Improved water retention through hydrophilization of water supply rollers - Anti-fogging properties through hydrophilization of glass - Condensation prevention, etc. Additionally, Nano Process has been renewed with three other new functions, each with different features and applications. [Features of Each Series] ■ TC-10S Excellent precision, visible light transmittance, water repellency, and oil repellency ■ TLS Series Superior non-stick properties similar to adhesive tape ■ NCFPC Series Excellent liquid runoff properties for water and oil Currently, we are offering technical materials summarizing the details of each series. If you are interested in more details or facing challenges with surface treatment in precision fields, please download the materials or contact us directly.

Company：吉田ＳＫＴ
Price：Other

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Thin Film Coating

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Sputtering Equipment Multifunctional Sputter Device MiniLab-S060A

Compact multi-film device that incorporates sputtering, deposition, EB, and annealing thin film modules in a 60L volume chamber, suitable for various applications.

4 units of Φ2 inch cathodes installed Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen with the plasma relay switch 3 systems of MFC (Ar, O2, N2) for reactive sputtering Plasma etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coat) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● It is also possible to configure a mixed specification for resistance heating deposition, organic material deposition, EB deposition, etc.

Company：テルモセラ・ジャパン本社
Price：Other

Sputtering Equipment
Evaporation Equipment
CVD Equipment
Thin Film Coating

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Thin Film Coating Product List and Ranking from 33 Manufacturers, Suppliers and Companies | IPROS GMS

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