□■□【MiniLab-090】Flexible Thin Film Experimental Device□■□
Storage-compatible glove box PVD flexible thin film experimental device, featuring a tall chamber with a height of 570mm, contributes to improved uniformity during deposition.
MiniLab-080 is a glove box model designed to accommodate an 80ℓ large volume chamber within a glove box bench. It features a slide-open and close chamber that maximizes the use of the workbench, and a rear-opening door designed with maintenance in mind. Samples processed can be consistently handled in a controlled environment inside the glove box without exposure to the atmosphere or moisture. For specifications of the GB model, please refer to the gas purification unit. - Maximum substrate size: Φ10 inch - Resistance heating evaporation source x up to 4 sources - Organic evaporation source x up to 4 sources - Magnetron sputtering cathode x 4 sources - Electron beam evaporation - Substrate heating stage (standard 500℃, Max 1000℃) - Plasma etching / <30W soft etching
- Company：テルモセラ・ジャパン 本社
- Price：Other
