High-intensity 172nm excimer lamp, surface illuminance of 150mW/cm² or more.
**Features**
- High brightness and high uniformity due to high-intensity RF discharge method
- Direct irradiation on the lamp tube surface without electrodes or quartz windows on the irradiation surface
- Excimer lamps can be lit even in a vacuum environment
- Significant reduction in nitrogen usage due to a unique slit holder
- Adjustable illuminance for each lamp
- Effective lamp length: up to MAX G10 size
**Electrode-less Irradiation Unit & N2 Slit Holder Structure**
The lamp structure does not have electrodes on the irradiation surface, resulting in no obstruction of light and minimal transmission or reflection losses, leading to high efficiency. Nitrogen (CDA) is ejected along the lamp tube wall from individual lamp holders. Ozone is generated efficiently, allowing for uniform control of oxygen concentration with a small amount.
**Main Applications**
- Surface modification for cleaning glass, films, and wafers
- Bonding of films, glass, resins, metals, etc.
- HDD cleaning, modification, and lubrication oil curing
- Resist removal and ashing
- Cleaning of chip, film, and substrate bonding surfaces
**Examples of Equipment Installation**
- Pre-cleaning equipment for G8 size TFT substrate film formation
- Roll-to-roll cleaning equipment
- Resist ashing equipment
