Electronic Components and Semiconductors

フジミインコーポレーテッド

EstablishmentMarch 20, 1953 (Showa 28)
capital475343Ten thousand
number of employees1110
addressGifu/Kakamigahara-shi/Techno Plaza 1-8
phone058-379-3210
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Cemented carbide powder for 3D printers Cemented carbide powder for 3D printers
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Silicon carbide, SiC particles Silicon carbide, SiC particles
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Silica

Silica particles

Introduction of silica particles.

High Purity Colloidal Silica Slurry Polishing Material 'COMPOL'

Achieve a damage-free polished surface with high efficiency! Mirror finishing is possible on various materials such as electronic material substrates like sapphire, metals, and ceramics.

"COMPOL" is a high-purity colloidal silica slurry developed specifically for polishing electronic material substrates such as sapphire, as well as metal materials and ceramics. It excels in particle uniformity and dispersion, achieving a high-efficiency, damage-free polished surface. [Contents] - Representative physical properties of COMPOL - SiO2 content - pH - Specific gravity - Average particle size - Standard quantity *For more details, please refer to the PDF document or feel free to contact us.

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