ダルトン Product Lineup

We remove impurities adhering to the inner walls of the cylinder through heating and vacuum extraction. The cylinder size and the number of units processed simultaneously can be customized. We can propose automatic or manual machines according to your budget. 【Features】 ■ Uniform heating of the cylinder is possible (Max 200℃). The temperature inside the furnace is approximately ±1%. ■ Simultaneous cooling of the safety valve of the cylinder is possible during heating (to prevent damage to the safety valve due to heat). * For more details, please download the PDF (catalog) or feel free to contact us.

By using a plate heater with polished technology and special surface treatment on the bottom surface of the vapor generation tank, it is possible to uniformly boil the HFE within the vapor generation tank and generate uniform vapor inside the tank. *For more details, please download the PDF (catalog) or feel free to contact us.

The anodizing device was traditionally a device that flowed current to form an oxide film, but the further developed porous silicon formation device is one that forms porous silicon by changing the chemical solution used and the current density. *For more details, please download the PDF (catalog) or feel free to contact us.*

We can also design and manufacture cleaning fixtures for large equipment. In the case of cassette cleaning, we can provide precision cleaning with integrated brushes. *For more details, please download the PDF (catalog) or feel free to contact us.*

We offer a variety of oscillation mechanisms. From manual types to fully automatic types, we will propose options that suit your specifications and budget. 【Optional Features】 ○ Leak sensor ○ Exhaust pressure sensor ○ Emergency stop switch ○ Pause switch (with automatic mechanism) ○ Door sensor (with automatic mechanism) ○ Pressure switch ○ Temperature sensor (constant temperature specification) ○ Automatic fire extinguishing system ○ Patrol light ○ Wired glass or tempered glass ○ Explosion pressure hatch ○ Various interlocks, etc. *Some devices may not be installable depending on the equipment. *You can conduct tests at our Tokyo Test Center (Sumida Ward, Tokyo). (Online support available) *For more details, please download the PDF (catalog) or feel free to contact us.

We achieve low cost and high productivity unique to wet etching. We can accommodate various transport positions and methods according to your needs, and customization with additional mechanisms is also possible. 【Features】 ■ Fully automatic acid and alkaline etching (cleaning) equipment ■ Manual acid and alkaline etching (cleaning) equipment ■ RCA cleaning equipment ■ In addition to front transport type and rear upper transport type, we can also accommodate upper transport type and rear transport type according to customer needs. ■ You can choose from carrierless transport, carrier transport, carrier hanger transport, etc., according to your budget. ■ Additional handover mechanisms with front and rear devices and external communication functions are possible. ■ Automatic doors, automatic lids, automatic chemical supply, weighing, and recovery devices can be equipped. ■ It is possible to equip a concentration management mechanism for etching solutions. Please consult us regarding the target chemicals (e.g., TMAH, KOH, HF, HCL, etc.). ■ Temperature distribution measurement in the etching processing tank can be performed as a pre-shipment inspection. ■ In addition to the up-and-down oscillation mechanism, a wafer rotation mechanism can also be added. * Testing can be conducted at our Tokyo Test Center (Sumida Ward). (Online support available) * For more details, please download the catalog or feel free to contact us.

Dalton's lift-off devices come in six models and offer six types of options, allowing you to select the appropriate one based on your application and the characteristics of the wafer. 【Models】 - HU Type (for mass production)… A combination of batch and single wafer specifications. Faster and more reliable finishing. - HM Type (for research and development/mass production)… Suitable for wafers that can be stripped using only jet processing. - CHU Type (for research and development)… Inherits the features of the HU type while achieving compactness. - MJ Type (for research and development)… Contains only a jet chamber, with manual operation for wafer loading and unloading. - SL Type (for mass production)… A shower drain type lift-off device that performs lift-off processing using only a dip tank. - ML Type (for research and development/mass production)… A device that removes the loader, conveyor, and unloader from the SL type. You can add five types of options to the above six models. For details on the options, please scroll down and take a look. Testing can be conducted at our Tokyo Test Center. *For more information, please download the catalog or feel free to contact us.

We offer storage solutions that cater to various needs. *For more details, please download the PDF (catalog) or feel free to contact us.*

Automatic Acid and Alkali Cleaning Device Compatible Work Sizes: φ2 to 12 inches. Please consult us for special sizes such as square substrates. The cleaning process is achieved by directly using two types of concentrated solutions through a two-fluid mixing nozzle. By adjusting the mixing ratio, it is possible to raise the temperature to the desired level using the reaction heat. 【Other Features】 ■ Capable of manufacturing devices with brush cleaning functions ■ Capable of manufacturing photo mask cleaning devices ■ Chemical supply and recovery unit can be integrated into the main device ■ Ozone water cleaning available as an option ■ Nanobubble cleaning available as an option You can conduct tests at our Tokyo Test Center. (Online support available) *For more details, please download the PDF (catalog) or feel free to contact us.

This is a device for processing sheet substrates used in LCD glass and touch panels. 【Features】 - Compatible with workpieces ranging from 100mm to 1000mm square (other sizes and shapes can be discussed separately) - By adding a swinging mechanism (horizontal swinging and spray nozzle pivoting), processing efficiency is improved - Cassette-to-cassette operation is also possible *For more details, please download the PDF (catalog) or feel free to contact us.

This is a fume hood that accommodates SUS specifications and PVC specifications through the use of chemical solutions, ensuring both user operability and safety. *For more details, please download the PDF (catalog) or feel free to contact us.*

We can also design and manufacture cleaning fixtures for large equipment. In the case of cassette cleaning, we can provide precision cleaning with integrated brushes. *For more details, please download the PDF (catalog) or feel free to contact us.*

The anodizing device was traditionally a device that flowed current to form an oxide film, but the further developed porous silicon formation device is one that forms porous silicon by changing the chemical solution and current density used. *For more details, please download the PDF (catalog) or feel free to contact us.*

Can be embedded in automatic machines *Also available for fragile (such as GaAs) workpieces. *For more details, please download the PDF (catalog) or feel free to contact us.

We have stockers available for various uses.

We have stockers available for various applications. *For more details, please download the PDF (catalog) or feel free to contact us.*

We have stockers available for various applications. *For more details, please download the PDF (catalog) or feel free to contact us.*

- It can be installed in accordance with devices such as etching and cleaning equipment. - Gases such as acids and alkalis are treated appropriately. - By properly processing with a scrubber, there is no impact on the ducts and equipment in the subsequent processes. Additionally, even if exhausted outdoors, there are no concerns for the surrounding environment or human health. *For more details, please download the PDF (catalog) or feel free to contact us.*

Continuous type: In cases where the wastewater generation amount is approximately 30 to 250 liters per day, if the amount of residue (substances other than the components to be distilled and regenerated) is small, whether in liquid or solid form (the continuous type can be operated automatically). *For more details, please download the PDF (catalog) or feel free to contact us.

Batch type: When the amount of waste liquid generated is about 10 to 150 liters per day, it can handle substances other than the components to be distilled and regenerated (residual materials) in both liquid and solid forms. (Batch type cannot operate continuously in an automated manner.)

By compactly organizing the necessary utility connections for the spin coater on the back side of the fume hood, the safety and workability of the workspace are improved.

【Reduction of Environmental Impact】 - Only pure water is used for the cleaning solution. - The amount of pure water used is less compared to other products. 【High Cleaning Capability】 - Capable of cleaning residues and particles with a unique cleaning process. - Can generate warm air instantly. (From room temperature to 65°C in 3 seconds) - Allows for separate cleaning of the FOUP BOX and its lid. - Rapid cleaning of stubborn adhesives and particles is possible with the adoption of instant heating. - High-pressure cleaning enables the removal of contaminants with strong adhesion, such as resist. *Max approximately 10MPa (1500psi) can be adjusted in the recipe.

By combining with two-fluid cleaning, it is possible to remove strong adherents and fine particles. It is mainly used for cleaning after CMP. Example of equipment configuration: Loader ⇒ 1. Brush cleaning chamber ⇒ 2. Rinse drying chamber ⇒ Unloader 1. Brush cleaning chamber ⇒ Chemical shower → Double-sided brush cleaning → Pure water rinse 2. Rinse drying chamber ⇒ Two-fluid (N2 + pure) cleaning → MS shower (optional) → N2 blow drying