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  1. Home
  2. Chemical
  3. 奥野製薬工業 大阪・放出、東京、名古屋など
  4. We will exhibit at the 1st [Kyushu] Semiconductor Industry Exhibition.
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  • Sep 04, 2024
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Sep 04, 2024

We will exhibit at the 1st [Kyushu] Semiconductor Industry Exhibition.

奥野製薬工業 奥野製薬工業 大阪・放出、東京、名古屋など
Our company will be exhibiting at the 1st [Kyushu] Semiconductor Industry Exhibition, which will be held at Marine Messe Fukuoka Hall B from September 25 (Wednesday) to 26 (Thursday), 2024. At our booth, we will showcase the latest surface treatment chemicals and process technologies for wafers and package substrates, so please stop by. For more details, please check the related link [We will be exhibiting at the 1st [Kyushu] Semiconductor Industry Exhibition].
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We will exhibit at the 1st [Kyushu] Semiconductor Industry Exhibition
Our company will exhibit at the 1st [Kyushu] Semiconductor Industry Exhibition, which will be held at Marine Messe Fukuoka Hall B from September 25 (Wednesday) to 26 (Thursday), 2024. The booth location is 3-7. At the booth, we will showcase the latest surface treatment chemicals and process technologies for wafers and package substrates. For more details, please visit the official website of the [Kyushu] Semiconductor Industry Exhibition listed below.

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Copper sulfate plating additive for wafers - TORYZA LCN series

Newly developed copper sulfate plating chemicals for wiring of semiconductor wafers.

As the functionality, performance, and miniaturization of semiconductors continue to evolve, new technologies related to three-dimensional integration of semiconductors are being developed one after another. Consequently, addressing the miniaturization of wiring (narrow pitch) and heat dissipation measures has become increasingly important. To meet various demands, our company has newly developed sulfuric acid copper plating chemicals, the TORYZA LCN series, for semiconductor wafer wiring.

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TORYZA LCN SP製品情報.png

Copper sulfate plating additive for semiconductor wafers - TORYZA LCN SP

TORYZA LCN SP, the optimal electroplating solution for forming copper pillars on semiconductor wafers and package substrates.

Solder balls have been widely used in semiconductor packaging. However, due to the increase in pin count (the number of terminals on the substrate), the increase in the number of chips being packaged, and the reduction in bonding area, solder bumps with a diameter of about 100µm are becoming insufficient for high-density packaging. As an alternative, attention is being drawn to a method that involves forming a redistribution layer (RDL) on the semiconductor and using copper pillars for bonding. Our company has developed the optimal additive for copper pillars, TORYZA LCN SP. TORYZA LCN SP can also be used to form ultra-fine electrodes on the build-up layer of the package substrate.

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Copper sulfate plating additive for semiconductor wafers - TORYZA LCN SV

Supports high aspect ratio filling, copper sulfate plating additive for silicon interposers - TORYZA LCN SV.

With the advancement of semiconductor performance and functionality, packaging technologies related to chiplets that implement multiple chips with different functions on a single substrate and three-dimensional integration are gaining attention. Among these, silicon interposers with wiring formed on silicon are attracting interest because they can miniaturize the length and width of the wiring, thereby enhancing the transmission capability of high-frequency signals. Our company has developed TORYZA LCN SV as an additive for silicon interposers that supports high aspect ratio filling. TORYZA LCN SV excels in embedability into TSVs, achieving void-free and low film thickness high aspect ratio filling.

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TORYZA LCN SD製品情報.jpeg

Copper sulfate plating additive for semiconductor wafers - TORYZA LCN SD

Copper sulfate plating additive for semiconductor wafers, high heat dissipation and high current applications - TORYZA LCN SD.

Smartphones are widely used not only for calls but also for content viewing such as music and videos, online shopping, and in industries like automobiles, smart home appliances, and robotics. Mobile communication devices like cell phones and tablets have undergone significant evolution approximately every 10 years, with their maximum communication speeds increasing by about 1,000,000 times over the past 30 years. Additionally, semiconductors used in servers and high-performance computers are required to achieve even higher performance and multifunctionality. Our company has recently developed a new copper sulfate plating additive, TORYZA LCN SD, which is optimal for low aspect ratio via filling. TORYZA LCN SD can be widely applied to microbumps that join semiconductor chips and build-up wiring boards, as well as thermal vias used for heat dissipation in trench wiring on wafers and power semiconductors.

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TORYZA LCN FRV製品情報.jpeg

Copper sulfate plating additive for semiconductor wafers - TORYZA LCN FRV

FOWLP, FOPLP, and next-generation semiconductor package substrates, as well as ultra-fine wiring copper sulfate plating additives - TORYZA LCN FRV.

In recent years, semiconductor packaging technology has gained attention with FOWLP and FOPLP, which allow for an increase in the number of terminals relative to chip area by forming a redistribution layer on the wafer and expanding the terminals to the outside of the chip (Fan Out), in contrast to the conventional FC-BGA that is disadvantageous for thinness and cost reduction. Our company has developed a new copper sulfate plating additive for the formation of the redistribution layer in FOWLP and FOPLP. This product excels in film thickness uniformity and rectangularity of pattern shape, and it also accommodates filling of small-diameter vias. Additionally, to support the increase in the number of terminals on the chip side, the formation of ultra-fine wiring layers on the build-up layer of conventional FC-BGA is also being considered. This product is optimal for the formation of ultra-fine wiring in next-generation semiconductor package substrates.

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Solving Weak-Micro Vias: High Connection Reliability Electroless Copper Plating Solution

Achieving thin film deposition of non-electrolytic copper plating! It greatly contributes to the formation of fine circuits on semiconductor package substrates and the improvement of via connection reliability!

In recent years, with the miniaturization and high performance of electronic devices, semiconductor devices have also become more refined and functional. There is a growing demand for further miniaturization of wiring and reduction of via diameters in semiconductor package substrates that connect semiconductor devices to the main substrate. Okuno Pharmaceutical Industry has newly developed products to meet the demands for fine wiring. Highest via connection reliability: Electroless copper plating solution: OPC FLET Copper - Achieves crystal continuity at the bottom of the via - Conventional baths see a significant increase in resistance due to a decrease in the thickness of the electroless copper plating film OPC FLET Copper shows good conductivity even at low film thickness - Controls the plating deposition rate - The deposition rate becomes gradual over time, suppressing deposition on copper - Conventional baths tend to have excessive surface film thickness OPC FLET Copper achieves sufficient coverage at low film thickness - Excellent connection reliability for small-diameter vias

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Related catalog(8)

Copper sulfate plating additive for wafers - TORYZA LCN series

Copper sulfate plating additive for wafers - TORYZA LCN series

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Copper sulfate plating additive for semiconductor wafers, high heat dissipation and high current applications - TORYZA LCN SD.

Copper sulfate plating additive for semiconductor wafers, high heat dissipation and high current applications - TORYZA LCN SD.

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FOWLP, FOPLP, and copper sulfate plating additives for ultra-fine wiring such as semiconductor package substrates - TORYZA LCN FRV.

FOWLP, FOPLP, and copper sulfate plating additives for ultra-fine wiring such as semiconductor package substrates - TORYZA LCN FRV.

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TORYZA LCN SP, a plating additive suitable for forming copper pillars on semiconductor wafers and package substrates.

TORYZA LCN SP, a plating additive suitable for forming copper pillars on semiconductor wafers and package substrates.

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Copper sulfate plating additive for semiconductor wafers - TORYZA LCN SV

Copper sulfate plating additive for semiconductor wafers - TORYZA LCN SV

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Aluminum electrode on wafer UBM formation - TORYZA EL PROCESS

Aluminum electrode on wafer UBM formation - TORYZA EL PROCESS

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Electroless plating equipment for UBM formation for wafers - TORYZA EL SYSTEM

Electroless plating equipment for UBM formation for wafers - TORYZA EL SYSTEM

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High connection reliability electroless copper plating process for solving weak micro vias - OPC FLET process.

High connection reliability electroless copper plating process for solving weak micro vias - OPC FLET process.

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奥野製薬工業
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奥野製薬工業 大阪・放出、東京、名古屋など
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Please let us know your concerns regarding leaks. We may have some suggestions for you. Leak tests, leakage tests, leak inspections, leak detection, container integrity tests, packaging integrity tests...

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Fukuda Corporation has been pursuing leak detection for 60 years and is dedicated to advancing the future of leak testing. 【 Supporting Various Leak Tests: Air Leak Test / Gas Leak Test (Hydrogen Gas, Helium Gas) 】 We develop, manufacture, and sell leak testing equipment to inspect airtightness and sealing performance. We will propose suitable testers and devices for each inspection target. 【 Target Industries and Examples of Inspection Targets 】 - Automotive Industry: Engines, FC components, valves and piping, various parts - Electronic Components Industry: Smartphones, keyless switches, various small sensors - Pharmaceuticals / Food / Cosmetics Industry: Bottle containers, syringes, vials, eye drop containers, pillow packaging, PTP packaging We will propose the most suitable leak testers for each industry. 【 ISO Certification 】JIS Q 9001:2015 (ISO 9001:2015)

Aug 20, 2026

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Fukuda's Technology Column

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This is a collection of links to Fukuda's technical columns. It covers various topics related to leak tests and more... Please check the related links for more information.

Aug 20, 2026

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Hyper CLT flooring panel

CLT flooring boards that can also be used in material yards | Hyper CLT flooring boards

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In a civil engineering site material yard, not only is material storage conducted, but also the frequent movement of trucks and heavy machinery, unloading, and the movement of workers. On unpaved ground, mud and ruts can occur due to rain, which may reduce work efficiency. Hyper CLT mats are civil engineering CLT materials that utilize wood CLT. By laying them in material yards or storage areas, a work space that facilitates the movement of vehicles and heavy machinery can be established while protecting the ground. They can be laid only in necessary locations, and relocation or repurposing in accordance with construction progress is also possible. The 5×10 panel weighs approximately 230 kg, and the 5×20 panel weighs about 460 kg, making them lightweight and easy to install and remove even with small machinery. After use, they can also be utilized as temporary roads, access routes, or heavy machinery work yards. Additionally, they offer unique benefits of wood, such as glare reduction, noise suppression, and CO2 fixation. As a registered technology with the Ministry of Land, Infrastructure, Transport and Tourism under NETIS "TH-250021-A," these wooden mats can also be used for environmental improvement in material yards and innovative public works.

Aug 20, 2026

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AAEON UP Series Board for Embedded Applications with Intel Core Processor (Series 3) [UP WCL]

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Features: ● Equipped with Intel Core Processor (Series 3) ● Onboard LPDDR5 memory: up to 24GB ● Onboard UFS storage: up to 256GB ● 2.5GbE (2.5 Gigabit Ethernet): 1 port ● HDMI 2.1 (TMDS): 1 port ● USB 3.2 Type-A: 3 ports ● 10-pin GPIO: 1 port ● Power input: 12V DC * This model does not include an operating system.

Aug 20, 2026

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AAEON UP Series AI Development Board with Intel Core Series 3【UP Nexus WCL】

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Features: ●CPU: Intel Core Processor (Series 3) ●Onboard Memory: Onboard LPDDR5 (up to 48GB) ●Onboard Storage: Onboard UFS (up to 256GB) ●LAN: 2.5GbE ×2 (Intel Ethernet Controller I226-IT) ●USB: USB 3.2 Type-A ×2, USB 3.2 Gen 2x2 Type-C ×1 ●GPIO: 40-pin GPIO ×1 ●Video Output: HDMI 2.1 (TMDS) ×2, DP 1.4a (via USB Type-C) ●Serial Port: RS-232/422/485 (10-pin header) ×2 ●Expansion Slots: M.2 2230 E-Key ×1, M.2 2280 M-Key ×1, M.2 2242 M-Key ×1 ●Security: TPM 2.0 ●Power Input: DC 12–24V input

Aug 20, 2026

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