Starting from here: Analysis of ICP-OES and ICP-MS - Measurement Edition

ICP emission spectrometry device Smartly achieves minimal ownership costs and maximum productivity Agilent 5900 ICP-OES

Agilent 5900 ICP-OES Features - Industry's fastest class CCD detector dedicated to ICP-OES, reducing total running costs through rapid measurements - Simultaneous measurement of axial and radial - High matrix tolerance achieved through vertical torch and unique high-frequency technology - Full wavelength high-speed scanning (Intelli Quant 2.0) Measurement for all samples Display of spectral interference information from other elements for each sample - Automatic calculation of detection limits from calibration curves (QC function) - Data analysis support through statistical and testing functions for measurement values - Continuous monitoring of nebulizer gas pressure (PRO Software) - Notification of maintenance timing (notification timing can be customized) - Compact optical design achieved through unique technology, further improving detection limits and resolution

• Spectroscopic Analysis Equipment

ICP Emission Spectroscopy Analyzer: A Smart System to Enhance Productivity and Reliability - Agilent 5800 ICP-OES

Agilent 5800 ICP-OES Features - Reduction of total running costs through rapid measurements enabled by the world's fastest CCD detector dedicated to ICP-OES - High matrix tolerance achieved through a vertical torch and unique high-frequency technology - High-speed scanning across all wavelengths (Intelli Quant 2.0) Measurement for all samples Display of spectral interference information from other elements for each sample - Automatic calculation of detection limits from calibration curves (QC function) - Support for data analysis through statistical and testing functions for measurement values - Continuous monitoring of nebulizer gas pressure (PRO Software) - Notification of maintenance timing (notification timing can be customized) - Compact optical design achieved through unique technology, further improving detection limits and resolution

• Spectroscopic Analysis Equipment

Achieving MS/MS functionality! A mass spectrometer capable of handling challenging applications.

The "Agilent 8900 Triple Quadrupole ICP-MS (ICP-QQQ)" is a device that has emerged as the high-end model of "Agilent ICP-MS." It combines the well-established features of ICP-MS with the unique power of MS/MS, making it a groundbreaking analytical instrument capable of handling very challenging applications. By eliminating spectral interferences, it fully utilizes the true potential of reaction chemistry, enhancing accuracy and reliability of analysis in complex sample matrices. 【Features】 ○ Realizes MS/MS functionality ○ Achieves ultra-high sensitivity and low background ○ Significantly reduces polyatomic ion interferences ○ Enables high-sensitivity analysis of S, P, and Cl ○ Achieves sub-ppt BEC for Ca, among others For more details, please contact us or download the catalog.

• Other inspection equipment and devices

Powerful and highly flexible single quadrupole ICP-MS

The "Agilent 7900 Series ICP-MS" is a next-generation quadrupole ICP-MS that brings together innovative technology and achieves powerful automation. With matrix tolerance of several tens of % TDS, a dynamic range of up to 11 digits, and an effective helium collision mode, it accommodates all applications and enables highly accurate analysis. All components are designed to achieve excellent performance and reliability, enhancing analytical efficiency. 【Features】 ○ Powerful automation ○ Outstanding matrix tolerance ○ Exceptional dynamic range ○ Trace level detection ○ Suitable for all applications For more details, please contact us or download the catalog.

• Analytical Equipment and Devices

It can detect a wide dynamic range from trace amounts to high concentrations, and it is easy to set conditions for high matrix samples and complex applications.

What if there were a way to conduct analyses more accurately and efficiently? If we could prevent wasting time, staff could focus on tasks that enhance lab results. The Agilent 7850 ICP-MS makes that possible. Daily operations become smoother, reducing staff stress. Additionally, productivity increases, and the reliability of analytical results improves.

• Analytical Equipment and Devices

Easily removable injectors! Introducing products that eliminate the need to remove the entire torch!

Agilent ICP-OES parts and consumables are designed, manufactured, and tested based on strict specifications, supporting your analysis with comprehensive support. They are powerful tools that simplify analysis and help you achieve the necessary results. Among them, the "Full Demantable Torch" is compatible with the "Agilent 5000 Series ICP-OES" and can reduce maintenance burdens. 【Full Demantable Torch Features】 ■ Flexibility: Meets the demands of a wide range of applications ■ Increased productivity: Easy maintenance of injectors ■ No manual optimization required: Consistent results before and after injector replacement ■ Easy maintenance: Quick replacement possible *For more details, please refer to the PDF document or feel free to contact us.

• Analytical Equipment and Devices
• Spectroscopic Analysis Equipment

Parts and consumables that improve the performance and analytical quality of ICP-MS! Supports rapid screening of large samples.

Agilent ICP-MS parts and consumables are designed, manufactured, and tested based on strict specifications, supporting your analysis with comprehensive support. They are powerful tools that simplify analysis and help you achieve the necessary results. They enable reliable trace analysis, reduce interference, and contribute to increased productivity. Additionally, the "Agilent Cone Care Kit and Magnifier" enhance the reliability of ICP-MS interface cone inspections and reduce the burden. 【Features of the Agilent Cone Care Kit and Magnifier】 - Inspection of the condition of the sampling cone or gap cone - Check for the presence of matrix accumulation on the chip - Confirmation of the success of cleaning and maintenance procedures - Check the necessity for cone replacement (especially due to enlargement or damage of the opening) - Elimination of the hassle of removing the cone from the lab for inspection under a microscope *For more details, please refer to the PDF materials or feel free to contact us.

• Analytical Equipment and Devices
• Spectroscopic Analysis Equipment

The particle visualization technology developed under our brand "ViEST" has a very high level of detection sensitivity, capable of visualizing the suspended or adhered states of micro and nano-sized particles in real time. We are engaged in the sale of visualization systems and contract services for evaluation (investigating particles and airflow in production processes, inside and outside manufacturing equipment, evaluating the performance of cleaning products, proposing yield improvement measures, etc.) both domestically and internationally. In manufacturing environments, invisible fine foreign substances, dust generation, particle adhesion due to static electricity, and airflow disturbances can cause quality defects and reduced yield. Our company clarifies these contamination factors through visualization technology and provides consistent support from identifying the source of the problem to considering and confirming improvement measures. Do you have any of the following concerns? - Unable to identify the cause of foreign matter contamination - Want to check airflow and cleanliness in clean rooms - Want to understand dust generation from manufacturing equipment and transport systems - Want to reduce particle adhesion to films and substrates - Want to improve contamination that leads to reduced yield

[Lecturers] KPMG Consulting Co., Ltd. Executive Officer, Partner Kazushige Ikeda KPMG Consulting Co., Ltd. Technology Consulting Senior Consultant Kakeru Ota [Key Lecture Content] In recent years, AI has evolved beyond information processing in digital spaces, such as text generation and image recognition, to become Physical AI that perceives, judges, and acts in the real world by connecting with sensors, robots, vehicles, industrial equipment, and more. Physical AI is increasingly important across a wide range of fields, including manufacturing, as it addresses industrial challenges such as labor shortages, skill transfer, replacement of hazardous work, and productivity improvement. Additionally, foundational models, semiconductors, sensors, actuators, and robotics-related technologies that support Physical AI are becoming increasingly significant from the perspective of economic security, particularly in terms of responding to supply chain risks and securing and managing critical technologies. This lecture will organize the basic concepts and key technologies of Physical AI, discuss its potential applications in manufacturing and industrial sectors, outline practical considerations for implementation and operation, and explain the actions that companies should take moving forward.

[Instructor] Nobuyuki Oonaka, CEO of Bridge Inc., Project Designer [Key Lecture Content] "Why do new businesses often come to a halt?" The cause may not be a lack of ideas or talent. Through supporting over 300 new businesses and business developments, I have learned that what separates success from failure is "the structure of the organization"—specifically, how decisions are made, how dialogue occurs, and how assumptions are shared. In this seminar, based on the book "How to Create Self-Driving New Businesses" (Shoei-sha), we will analyze the "communication problems" that cause new businesses to stop as a structure. The goal is to develop a common language within the organization to identify "where we are stuck and what actions we should take." I will share how to use the "self-driving map" in practical terms.

In this seminar, we will focus on the challenges of sensitivity reduction and separation performance in GC/MS analysis, and introduce the latest technologies and practical know-how that can help solve these issues. This time, we will also have a presentation from LECO Japan, who will discuss the benefits and applications of high-resolution and high-separation analysis with real examples. Additionally, Restek will introduce column technologies effective for improving sensitivity in trace analysis. Restek: We will explain the inert performance of the RMX GC column, which is effective for improving sensitivity in trace analysis, and the column technology that suppresses adsorption loss in low concentration areas, along with actual measurement data. LECO: We will present the latest application examples of comprehensive detection of trace components using high-sensitivity GC-TOFMS and RMX columns, including environmental, aroma, and material analysis. This content is recommended for anyone involved in multi-component analysis using GC/MS, whether for target or non-target analysis, as well as those who are just starting out. We will provide clear explanations suitable for beginners in GC/MS, so please join us.

[Speaker] Hidetaka Ishibashi, Director of IoT Planning Department, KDDI Corporation [Key Lecture Content] Against the backdrop of declining birth rates, an aging population, and labor shortages, the nature of mobility is reaching a significant turning point. KDDI has established a "Mobility Control Center" to integratively support new mobility solutions such as autonomous vehicles, drones, and robots, based on the knowledge and infrastructure cultivated through the operation of connected cars. In this lecture, we will focus on the communication and monitoring functions that are essential for the social implementation of each mobility solution, discussing the challenges and efforts towards their resolution, as well as the future vision that KDDI aims for. [Lecture Items] 1. Efforts and history of connected cars 2. Development and initiatives for new mobility 3. Importance of remote monitoring in a mobility society 4. Challenges in communication and monitoring and efforts towards solutions 5. Future vision of the mobility society that KDDI aims for 6. Q&A