Demo units available for loan! Ideal for spin drying silicon wafers, masks, and film substrates!
~Overview~ - By incorporating an ULPA or HEPA filter into the lid, the cleanliness within the chamber is significantly improved by introducing clean air. - The replacement of the cradle allows for the drying of 4 to 8-inch wafers. For 12-inch wafers, it accommodates up to 2 carriers. - In the event of abnormal vibrations, it automatically stops.
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basic information
~Overview~ - By incorporating ULPA or HEPA filters into the lid and introducing clean air, the cleanliness within the chamber is dramatically improved. - By replacing the cradle, drying of 4 to 8-inch wafers is possible. For 12-inch wafers, it can accommodate up to 2 carriers. - In the event of abnormal vibrations, it automatically stops. - Special seals prevent the generation of particles from the rotating shaft. - We also manufacture spin dryers for special specifications, including glass substrates and ceramic substrate systems.
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Applications/Examples of results
1. Semiconductor industry: Spin drying of silicon wafers and masks 2. LCD industry: Spin drying of glass 3. Substrate industry: Spin drying of ceramic substrates, epoxy substrates, glass, and film substrates 4. Hard disk: Spin drying after cleaning 5. Lens: Spin drying after cleaning the lens
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Company information
Japan Create has been challenging cutting-edge technologies to respond to the diversification of the semiconductor industry with high precision, labor-saving, and miniaturization. We seek infinite possibilities in high technology and create reliable know-how that matches user needs with our uniqueness. We will continue to strive towards high-level technology.
![[Semiconductor/Class 100 Compatible] 100% Water-Free Air Nozzle](https://image.mono.ipros.com/public/product/image/2116982/IPROS15202438644694791694.png?w=280&h=280)
