Demo units available for loan! This is a device that performs a series of cleaning and etching processes, including pure water treatment and drying.
The spray-type wafer etching device performs a series of cleaning and etching processes, followed by pure water treatment and drying. For more details, please contact us or refer to the catalog.
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basic information
【Features】 ○ A series of cleaning and etching processes executed ○ Subsequently, pure water treatment and drying are performed ○ From manufacturing to after-sales support, customization is also available ● For more details, please contact us or refer to the catalog.
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Company information
Japan Create has been challenging cutting-edge technologies to respond to the diversification of the semiconductor industry with high precision, labor-saving, and miniaturization. We seek infinite possibilities in high technology and create reliable know-how that matches user needs with our uniqueness. We will continue to strive towards high-level technology.