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  1. Home
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  3. Manufacturing and processing machinery
  4. Semiconductor Manufacturing Equipment
  5. Annealing furnace
  6. Flash Lamp Annealing Device FLA

Flash Lamp Annealing Device FLA

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last updated:Jan 21, 2014

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Various materials such as semiconductors! Annealing is possible in ultra-short times ranging from a few milliseconds to several hundred milliseconds.

The Flash Lamp Annealing device, FLA, is a standalone unit designed for DTF-FLA ultra-short time annealing. It is capable of ultra-short annealing times ranging from a few milliseconds to several hundred milliseconds for semiconductor materials and other materials. The very short pulses (micro/millisecond level) from the xenon flash lamp heat only the surface at an ultra-fast heating rate, making it a compact research and development device suitable for applications such as annealing films on flexible substrates and substrates with low heat resistance. It is compact, user-friendly, and ideal for research and development in various applications. For more details, please contact us or refer to the catalog.

    Annealing furnace
04.DTF-FLA.jpg

Flash Lamp Annealing Device FLA

04.DTF-FLA.jpg
04.DTF-FLA.jpg
  • Related Link - http://www.matsubo.co.jp/product/division/cat02/ca…
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【Features】 ○ Standalone device designed for DTF-FLA ultra-short time annealing ○ Capable of ultra-short time annealing from a few milliseconds to several hundred milliseconds for semiconductor materials and other materials ○ Compact and user-friendly, ideal for research and development in various applications ○ Surface heating at ultra-fast heating rates using very short pulses (micro/millisecond level) from a xenon flash lamp ○ Used for annealing processes on flexible substrates and films on low-temperature resistant substrates ○ Improvement of film quality for heteroepitaxial layers in solar cells such as CIS and CIGS (flexible, glass substrates, etc.) ○ Modification of transparent conductive oxide films like ITO (flexible, glass substrates, etc.) ○ Enhancement of crystallinity in a-Si and Poly Si ○ Annealing treatment of semiconductor materials, ultra-thin metal films, and silicon nanoparticles using inkjet ○ Formation of nanocrystals such as Si, Ge, and Sn ○ Local melting-recrystallization / FLASiC (SiC on Si) ○ Activation of dopants (SiC/GaAs) for ultra-shallow junctions (Si) ● For more details, please contact us or refer to the catalog.

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Applications/Examples of results

【Applications】 ○ Lamp annealing ○ Annealing ○ Annealing equipment ● For more details, please contact us or refer to the catalog.

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Flash Lamp Annealing Device FLA

Flash Lamp Annealing Device FLA

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Matsubo provides services in two business areas: [Industrial Machinery & Information] and [Powder Technology], supported by a [Technical Center] backup system. Breaking away from the confines of a specialized machinery trading company, we have established a comprehensive service system to ensure our customers can use our products with confidence, ranging from consulting prior to implementation, engineering related to installation and localization, to maintenance and proposals for improvements and modifications after installation.

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