Using the JPV method, non-contact measurement of junction leakage in PN junctions, evaluation of the depletion layer capacitance, and rapid measurement of the sheet resistance of PN junction samples!
The JPV method (Junction Photo Voltage method) allows for fast and reproducible mapping measurements. 【Features】 - Non-contact, non-destructive measurement - No adjustment of probes required - No special sample preparation needed for measurement - Measurement possible even with oxide films or coatings on the surface - High spatial resolution distribution measurement (mapping) can be performed quickly - Highly reproducible measurements are possible - Can be integrated with Semilab's benchtop platforms WT-2000, WT-2500, WT-3000, or inline wafer testing equipment.
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basic information
【Measurement Items】 - Sheet Resistance (Rs) - Junction (Depletion Layer) Capacitance (Cd) - Leakage Current (Junction Leak)
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We have numerous achievements in semiconductor process management.
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Semilab is a comprehensive measurement device manufacturer that supports research and manufacturing of cutting-edge technologies worldwide. We handle non-contact CV measurement devices, lifetime measurement devices, spectroscopic ellipsometers, photoluminescence, DLTS systems, sheet resistance measurement devices, nanoindenters, AFM, and more for the inspection of semiconductor wafers and devices. Please feel free to contact us for specifications and pricing of our devices.
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