It features a compact structure with a simple and low-cost design. Achieves ultra-flat processing and damage-free processing! Ideal for surface modification and high-quality thin film formation.
This device can achieve ultra-smoothing and modification of surfaces with low damage by irradiating a beam (GCIB) that ionizes and accelerates a group of tens to tens of thousands of gas atoms or molecules at moderate energy onto unprocessed materials. Due to the atomic and molecular level processing, it is possible to smooth, etch, and surface process already shaped fine structures. 【Features】 ■ Suitable for nano-order fine processing ■ Flattening processing with Ra of a few nanometers ■ Compatible with reactive gas treatment ■ Processing possible at substrate surface temperatures below 100°C For more details, please contact us or download the catalog.
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basic information
**Features of the GCIB (Gas Cluster Ion Beam) System** ○ Sample Holding Stage - The stage is custom-made to fit the target object, allowing for adjustments in X-Y-Z positions, rotation, and incident angle. - By performing X-Y scanning, high uniformity of beam irradiation is achieved. ○ High Vacuum Operating Pressure - The gas cluster ion generation chamber and the beam irradiation chamber are separated, maintaining the irradiation atmosphere at a high vacuum level of around 10^-3 Pa, preventing contamination and plasma damage to the surface of the target object. ○ Reactive Gases - Cluster beam irradiation with reactive gases is possible depending on the processing conditions of the target object. - N2, O2, CO2, SF6, CF4, CHF3, B2H6 ○ Flexibility - Customer requests are reflected as much as possible during the design of the gas cluster ion beam system, resulting in a custom research and mass production facility tailored specifically for the customer. - Production of GCIB-assisted deposition systems is also available. ● For more details, please contact us or download the catalog.
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Applications/Examples of results
【Applications】 ○ As a GCIB (Gas Cluster Ion Beam) device → For surface modification and high-quality thin film formation → For ultra-flat processing, damage-free processing, and high-speed processing ● For more details, please contact us.
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Company information
Our company started in 1988 as an overseas export trading company for vacuum thin film manufacturing equipment, and has expanded its operations as a "total planner of vacuum technology" up to the present day. During this time, we have focused on the development of optical thin film materials, as well as the sales of ion beam processes and refrigeration units (Sapcold). Additionally, we have developed and are set to launch the GCIB (Gas Cluster Ion Beam) process equipment, which is expected to be an important technology in the next generation of nano-processing. Starting with glasses and camera lenses, we now see new media continuously emerging in the optical-related industry, including digital cameras, mobile phones, and medical lenses.
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