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  6. Solid Source ECR Plasma Deposition Device "AFTEX-2300"

Solid Source ECR Plasma Deposition Device "AFTEX-2300"

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last updated:Jan 23, 2023

JSWアフティ
JSWアフティ
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It is possible to obtain highly crystalline thin films at low temperatures! A cost-effective plasma deposition device.

The "AFTEX-2300" is a high-performance solid source ECR plasma deposition system equipped with a microwave branch-coupled ECR ion source, a load-lock mechanism, and a turbo molecular pump, all at a low price. Thin films grow under the irradiation of high-density ions controlled at low energies of 10-30 eV, resulting in dense, high-quality thin films with atomic-level smoothness. Thanks to the ion assist effect, it is possible to form compound thin films such as oxide and nitride films without high-temperature heating, and it is also possible to obtain highly crystalline thin films at low temperatures. 【Features】 ■ Equipped only with the basic functions of a solid source ECR plasma deposition system ■ Lower price compared to automatic deposition systems ■ Achieves long-term stable operation ■ Clean deposition environment ■ Various interlock mechanisms adopted *For more details, please refer to the catalog or feel free to contact us.

    Other semiconductor manufacturing equipment
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Solid Source ECR Plasma Deposition Device "AFTEX-2300"

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  • Related Link - https://jsw-afty.co.jp

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【Specifications】 ■Vacuum Exhaust System  ・Deposition Chamber: TMP (450 L/s)  ・Load Lock Chamber: RP (250 L/min) compatible with TMP ■Deposition Chamber  ・Chamber Dimensions: φ570x340mm  ・Substrate Size: φ4 inches  ・Substrate Heating: Optional  ・Target-Substrate Distance: 200mm ■Load Lock Chamber  ・Transport Method: Transfer Rod  ・Storage Capacity: 1 piece ■ECR Plasma Source  ・Quantity: 1 set (microwave branching coupling type)  ・Plasma Chamber: φ150mm  ・Cylindrical Target Section: φ100x40mm *For more details, please refer to the catalog or feel free to contact us.

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【Purpose】 ■Research on thin films such as oxides and nitrides *For more details, please refer to the catalog or feel free to contact us.*

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AFTEX-2300

AFTEX-2300

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JSWアフティ

JSWアフティ

Electronic Components and Semiconductors

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JSW Afti Corporation has been developing based on ECR plasma deposition technology within the NTT Group since its establishment. It started as part of the Mitsui Engineering & Shipbuilding Group in September 2007, when the semiconductor and flat panel manufacturing equipment businesses of the group companies were integrated into our company. In April 2014, we began anew as part of the Japan Steel Works Group, consistently handling everything from development to manufacturing, sales, and after-sales service, contributing even more to the value creation for our customers. We will not only unleash the potential of the technological resources we have developed and accumulated so far but also focus on their improvement and the development of new technologies, striving through these efforts to realize a prosperous future for our customers, ourselves, and society.

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