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  3. Manufacturing and processing machinery
  4. Semiconductor Manufacturing Equipment
  5. Sputtering Equipment
  6. Conductive carbon thin film formation device (arc discharge sputtering device)

Conductive carbon thin film formation device (arc discharge sputtering device)

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last updated:Sep 03, 2020

神港精機 東京支店
神港精機 東京支店
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Conductive carbon thin films are formed by sputtering. Stable film formation is achieved through a simple process with inert gas and carbon target at low temperatures (below 400°C).

Using the independent high-density sputtering method, conductive carbon thin films are formed through a process equivalent to metal film deposition via arc discharge magnetron sputtering (ADMS method). Compared to conventional sputtered carbon thin films, these films are characterized by significantly higher density and adhesion. Due to their conductive properties and film stability, they are suitable for new fields such as energy and biosensors. Conductive carbon thin films excel in hardness and surface smoothness, making them applicable for surface treatment of mechanical parts (tribological applications) due to their high adhesion to metals.

    Other processing machinesSputtering EquipmentPlasma surface treatment equipment
ADMS.png

Conductive carbon thin film formation device (arc discharge sputtering device)

ADMS.png
ADMS.png
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Equipped with a uniquely developed arc discharge type magnetron cathode. Capable of forming not only conductive carbon thin films but also various reaction films (nitride films, oxynitride films). The arc discharge type magnetron cathode also supports ion etching and nitriding of substrates before film formation. The multi-cathode allows for the layered deposition of an adhesion layer and conductive carbon film tailored to the substrate. Supports new material development, such as the addition of metals to conductive carbon films through simultaneous sputtering. Offers two models: a large batch type for surface treatment with a proven basic chamber configuration and a compact type for R&D.

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For new device R&D Surface treatment for machine parts

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Company information

神港精機

神港精機 東京支店

Industrial Machinery

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Shinko Seiki, as a technology-driven manufacturer, leverages the numerous know-how accumulated particularly in the field of vacuum equipment to deliver innovative products that meet user needs. In recent years, the company has also been challenging cutting-edge fields such as electronics and new materials, aiming to develop truly valuable hardware and software through the advancement of distinctive technologies and their organic integration.

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The related categories of Other processing machines

  • Manufacturing and processing machinery
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  • Plasma surface treatment equipment
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