We aim to expand applications into a wide range of fields, using fine processing of glass as our fundamental technology.
KISO WAVE Co., Ltd. is a new company established on March 10, 2020. We are grateful for the support we received under the name "Kiso Micro Co., Ltd." We aim to utilize the technology and experience cultivated in this world to contribute to the development of new products. We will support product development and mass production by utilizing various processing technologies such as material procurement, photolithography processing, wet etching processing, contour processing, blasting, polishing, laser processing, metallization (dry film formation & wet film formation), strengthening, cutting, and more. If you are considering what can be made with glass materials, please do not hesitate to contact us. 【Business Activities】 ■ Chemical processing of various types of glass ■ Patterning processing of various metal films ■ Assistance in product development using composite processing technologies *For more details, please refer to the PDF materials or feel free to contact us.
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【Products】 ■ Optical-related components ■ High-speed communication device components ■ Semiconductor-related components ■ MEMS sensor components ■ Flat panel display components ■ Life science-related components *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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In 1983, we were established as a thin film metal patterning factory of Micron Technology Research Institute, focusing on LCD substrates and PDP substrates, and have been producing cutting-edge products using photolithography and etching technologies. In 2007, we became a separate company as Kiso Micro Co., Ltd., enhancing our commitment to challenge ourselves with more creative products and aiming to be a trusted company by our customers as a company that can create for the future. Please utilize our services from development to mass production.
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