Technical Handbook Giveaway! Introducing advantages of types, comparisons with other products, quality, implementation effects, and more.
This document is a technical handbook introducing cleaning wafers designed to remove debris/particles from wafer chucks. It includes excellent effects in photolithography, etching, and sputtering processes, as well as advantages in terms of types, comparisons with other products, quality, and implementation effects. We encourage you to read it. 【Contents (partial)】 ■ What is a Chuck Cleaning Wafer (CCW)? ■ Introduction to CCW (history of development, materials) ■ Product introduction of CCW (types, advantages over other products, quality) ■ About Particle/Defect Removal Film *For more details, please refer to the PDF document or feel free to contact us.
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【Other Published Content】 ■Effects of CCW Introduction ・Photolithography: (1)(2) ・Etching: (1)(2)(3) ・Sputtering: (1)(2) ■Summary ■Company Overview *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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A company that can respond instantly to the rapidly changing information society, that is Kyodo International. It has been 50 years since the company was founded. And a new challenge! We will face difficulties more strongly and boldly than ever. We look forward to your continued support.
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