Significant reduction in footprint and purchase costs, increased throughput, and substantial improvement in substrate quality.
■Suitable for various WET processes such as etching, RCA cleaning, and developing ■Ideal for organic stripping/lift-off processes that do not use ultrasound ◎Compatible with high-pressure jet and spray treatments ◎When using ultrasound for effective removal of dry-etch residues and burrs during lift-off, the "Spin Dip Processor" is recommended. ■Full process of chemical solution ⇒ rinse ⇒ drying in a single chamber, supporting Dry-In/Dry-Out ◎Conventional method: 2-chamber configuration (substrate remains in a chemical solution during transfer between chambers) ◎New method: UDS type uses a 1-chamber configuration. ■Basic operation of the substrate ◎ "Upper section... LD of the substrate" ⇒ "Lower section... chemical treatment" ⇒ ⇒ "Middle section... rinse and dry" ⇒ "Upper section... ULD of the substrate" ■The patented isolation plate ensures the concentration of the chemical solution during reuse. ◎Since there is no dilution from rinse water contamination, the chemical solution can be temperature-controlled and reused. *For more details, please refer to the PDF document or feel free to contact us. Wafer, batch-type cleaning equipment, substrate cleaning equipment, spin cleaning equipment, semiconductor manufacturing equipment, resist stripping equipment, resist coating equipment, cleaning equipment, megasonic, photoresist, photolithography process.
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【Other Features】 ■ Complete separation and prevention of chemical gas and mist in the lower processing section with a patented isolation plate. ■ Chemical and rinse treatment is possible on the back side of the substrate, ensuring it is contamination-free. ■ Shortening of the manufacturing process significantly increases production efficiency and can greatly reduce clean room occupancy area. ◎ "One-pass processing" of etching and stripping is possible within the 1-system device. ■ Processing of ultra-thin and fragile substrates such as TAIKO substrates is also possible. ■ Please also refer to the UDS spin processor for etching, RCA cleaning, and developing systems. * For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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* Under a team of experts well-versed in the manufacturing processes of various devices, we engage in consistent in-house activities that include the custom development, manufacturing, and sales of distinctive wet processing equipment tailored to meet the diverse needs of our clients, backed by years of accumulated know-how since our establishment, as well as after-sales support. * We manufacture and sell optimal system equipment while proposing processes that align with our clients' needs. * Our company is well-acquainted with various equipment forms such as batch (wet stations) and sheet (conveyor, spin), and we have numerous achievements; however, we particularly stand out with our Spin sheet-type equipment. * With the establishment of "patents" and "trademarks," we ensure that our products, such as the "Spin Dip Processor" and "UDS Processor," which possess a wide variety of unique features, cannot be easily replicated by others, attracting worldwide attention.
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