High-quality substrates can be provided with high throughput and low cost!
- Ideal for etching and cleaning processes. - Chemical treatment is done using a spin method, and rinse drying is done using a conveyor method. - Proven track record of high throughput support with W-lane configuration. - Measures against hazardous corrosive gases during etching: ◎ Equipped with front and rear shutters and rollers in the spin chamber. - Features temperature control circulation and reuse function for chemicals, as well as concentrated/diluted separation function for wastewater. - Swing spray function during rinsing can also be installed. - Up and down air knife drying designed to prevent reattachment of rinse water splashes. *For more details, please refer to the PDF document or feel free to contact us. Wafer, batch-type cleaning equipment, coating and developing equipment, substrate cleaning equipment, spin cleaning equipment, semiconductor manufacturing equipment, semiconductors, resist stripping equipment, megasonic, cleaning equipment, resist, photoresist, photolithography process, silicon, scrub cleaning equipment, scrub cleaning, wafer stripping equipment, wafer cleaning equipment, wafer cleaning machine.
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basic information
For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
Please contact us for specific usage examples. We have numerous track records of use in various processing steps, including cleaning of various substrates such as masks/reticle substrates, FPD substrates, ceramic substrates, silicon wafers, quartz, gallium arsenide substrates, etc., as part of the pattern formation process on the substrate, pre-deposition cleaning, etching for oxide film removal, resist removal, dry etch residue, and lift-off processes commonly used in MEMS manufacturing.
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Company information
* Under a team of experts well-versed in the manufacturing processes of various devices, we engage in consistent in-house activities that include the custom development, manufacturing, and sales of distinctive wet processing equipment tailored to meet the diverse needs of our clients, backed by years of accumulated know-how since our establishment, as well as after-sales support. * We manufacture and sell optimal system equipment while proposing processes that align with our clients' needs. * Our company is well-acquainted with various equipment forms such as batch (wet stations) and sheet (conveyor, spin), and we have numerous achievements; however, we particularly stand out with our Spin sheet-type equipment. * With the establishment of "patents" and "trademarks," we ensure that our products, such as the "Spin Dip Processor" and "UDS Processor," which possess a wide variety of unique features, cannot be easily replicated by others, attracting worldwide attention.
![[Technical Explanation] Ultrasonic Cleaning of Gaskets and Seals](https://image.mono.ipros.com/public/default/object/noimage_l.gif?w=280&h=280)