Maximum substrate heating temperature of 1000℃! Reduces element loss specific to the substrate surface heating process!
The "Pressure RTA Device" is a product that can handle processes from vacuum to pressurization (0.9 MPaG). The heating source is a halogen lamp, and the heating rate can reach up to 150°C/sec, achieving excellent substrate temperature distribution and gas flow methods. This device can be used for applications such as semiconductors, MEMS, and electronic components, enabling high-speed thermal oxidation, crystallization, and annealing treatments on the substrate surface. 【Features】 ■ Reduces element loss specific to the heating process ■ Capable of handling processes from vacuum to pressurization (0.9 MPaG) ■ Enables high-speed thermal oxidation, crystallization, and annealing treatments on the substrate surface ■ Achieves excellent substrate temperature distribution and gas flow methods ■ Compatible with tray transport ■ Multi-chamber specifications can also be manufactured *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Specifications】 ■Substrate size: Maximum φ12 inches ■Reaction gases: O2, N2, H2O (optional) ■Substrate heating temperature: Up to 1000 ℃ (substrate surface) ■Heating source: Halogen lamp ■Heating rate: Up to 150 ℃/sec ■Vacuum exhaust: DP ■Control operation ・Control: PLC ・Operation: Touch panel or PC ■Data logging: External memory or PC ■Substrate transport: Atmospheric transport robot, cooling stage *For more details, please refer to the PDF document or feel free to contact us.
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【Applications】 ■Semiconductors ■MEMS ■Electronic components *For more details, please refer to the PDF document or feel free to contact us.
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Japan Create has been challenging cutting-edge technologies to respond to the diversification of the semiconductor industry with high precision, labor-saving, and miniaturization. We seek infinite possibilities in high technology and create reliable know-how that matches user needs with our uniqueness. We will continue to strive towards high-level technology.