Contract processing service for oxide films on silicon wafers (for research, development, and mass production)
Prototype support, small quantity support, 4 to 12 inch support, optional film thickness (10nm to 20μm), substrate arrangement possible, support for supplied substrates, short delivery time.
Since our establishment, we have consistently processed oxide films on silicon wafers. We can accommodate everything from small lot prototypes to large-scale production quantities. Additionally, we offer thick film processing that cannot be matched by other companies, ensuring we meet all of our customers' needs. In particular, our unique thick film thermal oxidation film formation technology has become an essential material for optical devices that support optical communications, and our products and technologies are adopted by communication equipment manufacturers and optical component manufacturers worldwide.
Inquire About This Product
basic information
For more details, please feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please refer to the PDF document or feel free to contact us.
Detailed information
-
Processing Support List
catalog（4）
Download All Catalogs
Company information
Seiren Adbvanced Materials Corp. provides various film deposition processing services for silicon wafers, focusing on oxide films, to customers around the world. Our representative product, the thick thermal oxide film, is shipped to customers globally as an essential material for optical communication components, which are experiencing market expansion in areas such as 5G and data centers. Additionally, we offer SOI wafers that achieve high quality and short delivery times, with production capabilities that can accommodate everything from prototypes (small lots) to mass production for MEMS and power semiconductors. We aim to continue contributing to society broadly through silicon wafer film deposition processing and to be an indispensable company for our customers.
![[Analysis Case] Evaluation of Metal Impurities in the Metal Film and Interface of the Device](https://image.mono.ipros.com/public/product/image/19d/2001538620/IPROS12249256516974712398.jpg?w=280&h=280)
