One-chamber multipurpose scrub cleaning. It is possible to remove foreign substances and metal contamination in one chamber! Space-saving, making it suitable for research and development.
This is a single-chamber device that performs various sizes and types of wafers, including surfactants, pure water scrubbing, chemical spraying, megasonic spot showering, and spin drying. It is a space-saving model that allows for complete cleaning within a single cleaning layer, making it suitable for locations with limited space. Please consult us regarding single-function scrub cleaning devices. 【Features】 ■ Cleaning, rinsing, and drying can be done in one place ■ Target wafers: Silicon, quartz, oxides, compounds, etc. ■ Compatible wafer diameters: φ2” to φ4”, φ6” to φ8” *For more details, please contact us or download the catalog for more information.
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【Purpose】 ■Various wafer cleaning
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This brand name was chosen to signify the creation of highly unique products with the aim of "EXTENSIVE VISION ON SYSTEM." Current technological innovations are remarkable, and the demands of the times are constantly becoming more advanced. We believe that it is our mission at Zebios to contribute to the industry by consistently proposing differentiated equipment that will revolutionize the now-mature equipment industry.
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