Next-generation power semiconductor SiC wafer
【Next-Generation Power Semiconductors】 SiC wafers generate less power loss and heat compared to conventional Si wafers, leading to an increasing demand for power semiconductors in recent years. They can withstand high voltage and current, making them useful in applications such as EV vehicles, railway vehicles, refrigerators, and LED light bulbs, among others. 【At Trinity】 At Trinity, we handle SiC wafers. We can source them from multiple manufacturers. Additionally, we can suggest wafers tailored to your specifications and applications, so please feel free to consult with us.
Inquire About This Product
basic information
For more details, please refer to the PDF document or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please refer to the PDF document or feel free to contact us.
catalog（12）
Download All Catalogs
Company information
Trinity primarily offers silicon wafers for semiconductors as our main product. We handle silicon wafers ranging in size from 2" to 12", and at our factory, we sort, inspect, and measure the silicon wafers that arrive daily to ensure stable quality and quick delivery, responding to customer demands with a rich inventory. We also provide dummy grade to monitor grade (particle-controlled products), thin wafers, patterned wafers, and more. Additionally, we offer film deposition processing. We handle wafers with thermal oxide films, sputtering, evaporation, and CVD, and we accept contract film deposition processing tailored to customer needs, from small-scale prototypes to mass production. Besides silicon wafers, we also offer SiC wafers in various grades. We provide high-quality SiC wafers at reasonable prices. We also accept processing for SiC wafers, including dicing, thickness specification, and bonding.
![Silicon wafer [Delivery time measures]](https://image.mono.ipros.com/public/product/image/537/2000176285/IPROS45007637500069541592.jpeg?w=280&h=280)
![[Analysis Case] Evaluation of Metal Impurities in the Metal Film and Interface of the Device](https://image.mono.ipros.com/public/product/image/19d/2001538620/IPROS12249256516974712398.jpg?w=280&h=280)
