A heating device capable of large-area simultaneous irradiation and high-intensity irradiation! It can also perform multiple pulse irradiations.
The "Flash Lamp Annealing Device" is a light-based heating device that instantly anneals objects within one second. Using the light from a xenon flash lamp that has a continuous wavelength range from UV to visible and infrared, it can be variably adjusted within a range of 0.1 to 60 milliseconds. It can be used for a variety of applications utilizing a wide spectrum, such as sintering, peeling, and surface modification. 【Features】 ■ Spectrum - Wide wavelength characteristics from ultraviolet to visible and infrared regions ■ High output and large area processing (shortened tact time, high uniformity) - Multiple flash lamps can be arranged according to the work size, allowing for large area simultaneous irradiation with high intensity (Max 70 J/cm²). *For more details, please refer to the PDF materials or feel free to contact us.
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【Other Features】 ■Depth Control (Pulse Control) - By controlling the current flowing to the lamp with a semiconductor switch to turn it ON/OFF, it is possible to adjust the lamp current and pulse width, allowing control of heating depth (0.1 to 60 msec). - Multiple pulse irradiation is also possible. *For more details, please refer to the PDF document or feel free to contact us.
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【Applications】 ■ Sintering ■ Stripping ■ Surface modification ■ Oxide film formation ■ Crystallization ■ Adhesion *For more details, please refer to the PDF document or feel free to contact us.
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Heating, hardening, cleaning, modification, surface treatment, adhesion, exposure, lighting, treatment, measurement, testing... When it comes to "light," leave it to Ushio. From light sources to units and light devices, we propose the optimal "light" tailored to your goals and applications with our unique light technology (we also offer joint experiments, joint research, and lending of demo and experimental equipment).
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