500℃ wafer stage! Adoption of a remote ICP source with no plasma damage.
The "Fiji G2" is a research and development ALD system that utilizes thermal and plasma methods. It employs an ICP remote plasma source and features a vacuum load lock for substrate transport, designed to produce high-quality ALD films of oxide, nitride, and metal layers. Additionally, it comes standard with a simple exhaust unit, the ALD Shield Vapor Trap, and can accommodate up to 6 plasma gas lines. 【Features】 ■ 500°C wafer stage ■ Remote ICP source with no plasma damage ■ Mode supporting ultra-high aspect ratios (<2000:1) (thermal) ■ Plasma gas lines: up to 6 lines ■ Precursor lines: up to 6 lines *For more details, please refer to the PDF document or feel free to contact us.
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【Other Features】 ■ Simple Decontamination Unit: ALD Shield Vapor Trap standard equipped ■ Dedicated reactor suitable for remote plasma *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Our company website features information on used equipment related to FPD and semiconductors. ● Main Business Activities Purchase of used semiconductor manufacturing equipment, refurbishment, sales, and setup operations Construction and consulting for semiconductor manufacturing lines Purchase of used FPD manufacturing equipment, refurbishment, sales, and setup operations Construction and consulting for FPD manufacturing lines Contract development, manufacturing, and sales of semiconductor manufacturing equipment and FPD manufacturing equipment Sales of various equipment parts Agency sales of overseas manufactured equipment