Difficult materials, various substrate shapes, and applications! Capable of accommodating a very wide range of substrate sizes.
We offer a "custom-made sputtering deposition system (PVD)" that can handle everything from research and prototyping to mass production. We support coating for decorative and surface protection purposes, as well as research and development to mass production of thin film devices such as flexible electronics, optical communication technologies, thin film solar cells, and batteries. We can assemble the system according to your needs, including sample size, deposition target materials, and batch processes. 【Features】 - Unique technology that accommodates all metal and oxide targets - Wafer sizes from 1mm x 1mm to 300mm x 560mm, with thicknesses up to 25mm - No need for hardware or software changes for deposition on different sizes - Thin Film Equipment recommended by research institutions across Europe *You can download the English version of the materials. For more details, please feel free to contact us.
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basic information
【Specifications】 ■ Board size: 1mm x 1mm to 300mm x 560mm, thickness < 25mm ■ Horizontal and Vertical options available ■ Additional cathode can be added ■ Heating system can be added ■ Compatible targets: Al, Cu, Au, Ag, Ti, W, Cr, etc., compatible with all metals and oxides (Specifications may vary depending on customer applications and requests) *You can download the English version of the document. For more details, please feel free to contact us.
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【Applications】 ■ Supports a wide range of applications from sensors, LEDs, OLEDs, MEMS, hybrid devices, and semiconductor devices to batteries, decorative and reinforcing coatings, etc. * You can download the English version of the materials. For more details, please feel free to contact us.
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Company information
Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for 48 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en
![[Example of Use] Sputtering Target Composite Material SiC/Si](https://image.mono.ipros.com/public/product/image/f42/2000180520/IPROS14162266355367390576.jpeg?w=280&h=280)
