Compact and versatile! This is a high-performance device that can also be adapted for device evaluation processes.
The "SHUTTLELINE(R) series" is a flexible semiconductor manufacturing device that supports PECVD and dry etching for thin film deposition and failure analysis processes. It is compatible with RIE/ICP-RIE and PECVD/ICP-CVD, and is a compact device that can be used for various applications with a range of options. It is recommended for companies and academia that need a compact lab-scale device for R&D or laboratories, or for those looking for a device that can perform both film deposition and etching in one unit. 【Features】 ■ High-precision, damage-free etching process ■ Supports various wafer sizes and shapes, including dies, packaged dies, wafer pieces, and full wafers ■ The shuttle system eliminates the need for hardware changes for different sample sizes ■ Multi-functional support for film deposition/etching in one unit ■ Proven adoption worldwide, with local support through Plasma-Therm LLC's global network *For more details, please feel free to contact us.
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【Specifications】 ■Size: (Main unit, standard) W~800mm x D1700mm x H1500mm *Size varies depending on configuration ■Gas piping: Up to 12 lines (11 process gas lines + purge N2) ■Compatible wafer sizes: Up to φ200mm full wafers, coupon types, packaged dies, etc. *Available sizes and quantities depend on the model ■Supported processes: Plasma CVD film deposition (PECVD, ICP-CVD), dry etching (RIE, HCD, ICP-RIE) ■Software: Controlled in conjunction with endpoint detection using Cortex(R) *For more details, please feel free to contact us.
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【Usage】 ■ For film formation, etching, cleaning, and patterning in semiconductor manufacturing processes ■ For the removal of polymer layers, interlayer insulating films, etc., in the evaluation process and failure analysis of semiconductor devices *For more details, please feel free to contact us.
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Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for 48 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en