1-chamber type liquid chemical spin scrub cleaning machine

We will provide an environment for scrub cleaning and chemical spin cleaning tests of wafers from φ2” to φ12” in response to research and development and small lot production with space-saving solutions by next spring.

The "Single Chamber Liquid Spin Scrub Cleaning Machine" is a cleaning device that allows for various combinations of non-contact cleaning methods such as high-pressure spray, ultrasonic spray, and chemical solutions, as well as contact cleaning methods like brushes. It completes the cleaning process to spin drying within a single chamber, contributing to space-saving design, which reduces installation space and costs. We can propose suitable equipment configurations based on various device configurations, chemical compositions, desired cleaning performance, and budget according to your needs. 【Features】 ■ Various cleaning methods and chemicals can be combined ■ Suitable for research and development applications and small to medium-sized sites ■ Ideal for sites developing and producing new materials such as SiC, GaN, and LT for small-diameter wafers and power semiconductors ■ Compatible wafer sizes: 3 inches to 6 inches (8 to 12 inches can also be accommodated upon separate consultation) *For more details, please refer to the materials. Feel free to contact us with any inquiries.

Other semiconductor manufacturing equipment