100% focus on BATCHSPRAY technology! Significantly reduces water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Fully automatic equipment.
This two-chamber system is designed for organic solvent-based chemicals for polymer residue and resist stripping. It includes a patented retainer comb processing system for the mixing of chemicals with high precision in the tank. Automatic management of moisture concentration in organic solvents is possible. 【Features】 ■ Throughput of up to 300 wph ■ Two process chambers ■ Uniformity with less than 1% variation ■ Installation area of less than 12 m² ■ Chemical recirculation through a tank system ■ Process execution possible with SiC/GaN *For more details, please refer to the PDF document or feel free to contact us.
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【Products Offered】 ■BATCHSPRAY Clean Autoload ■BATCHSPRAY Acid Autoload ■BATCHSPRAY Solvent Autoload ■BATCHSPRAY Acid/Solvent Autoload ■BATCHSPRAY Acid/Clean Autoload ■BATCHSPRAY Acid ■BATCHSPRAY Solvent *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Siconnex, headquartered in Europe, is a global manufacturer of wet process equipment for the semiconductor industry and related fields. We provide batch spray equipment for wet etching, cleaning, and resist stripping for a wide range of end products, including MEMS, power semiconductors, analog/mixed-signal semiconductors, and III-V semiconductors. Our equipment sets industry standards with safety, automation, compact footprint, high throughput, and efficient use of economic resources. There is a growing demand for our solutions as follows: - Environmentally friendly: cleaning and resist stripping with ozone - Optimal for small quantities and diverse processes with a small footprint - Automatic detection of etching end points with EPD - Efficient equipment that reduces chemical consumption