We can accommodate everything from special specifications for R&D to mass production! Approximately three times longer lifespan compared to standard grids.
We would like to introduce our "Ion Beam Etching (IBE) and Deposition Equipment (IBD)." We offer a lineup ranging from standard entry models to high-end models capable of precise control over film thickness uniformity and other parameters. We can accommodate special specifications such as glove box attachments for research and development in both corporate and academic settings. Additionally, we support everything from lab-scale R&D to mass production, enabling etching processes for difficult materials and deposition focusing on uniformity and film thickness distribution for various materials equipped with a dual ion gun system. 【Features】 - We can propose models tailored to your performance requirements, from standard entry models to high-end classes capable of precise control over film quality. - We can accommodate special specifications, including glove box connections, for research applications in R&D and academia. - Film thickness uniformity of less than 0.6% (3σ) has been achieved on 200mm wafers. *For more details, please feel free to contact us.
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basic information
【Other Features】 ■ Marathon grids achieve three times the lifespan compared to standard grids (can be mounted on products from other manufacturers) ■ Equipped with an ion gun that prevents RF shunt and anode disappearance through proprietary technology ■ Clustering with our devices such as plasma CVD and dry etchers is also possible ■ Various functions can be selected, including multiple target mounting and ion assist features through a dual ion gun system *For more details, please feel free to contact us.
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Applications/Examples of results
【Applications】 ■ Difficult etching processes for ferromagnetic materials such as FeNi and FeCo, as well as ferroelectric materials like PZT, AlScN, LiTaO3, and LiNbO3. ■ Film deposition of metal films such as Ta, Ti, and W, as well as oxide films like Ta2O5 and Nb2O5, and thin films of various materials with densities and high purity close to bulk, and excellent uniformity. *For more details, please feel free to contact us.
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Company information
Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for 48 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en
